Issue 43, 2008
From the journal:

Journal of Materials Chemistry

In situ generation of indium catalysts to grow crystalline silicon nanowires at low temperature on ITO†

Pierre-Jean Alet,ab   Linwei Yu,b   Gilles Patriarche,c   Serge Palacina  and  Pere Roca i Cabarrocas*b  

* Corresponding authors

a CEA, IRAMIS, SPCSI, Laboratory of Chemistry at Surfaces and Interfaces, Gif-sur-Yvette cedex, France
E-mail: serge.palacin@cea.fr
Fax: +33 1 69 08 64 62
Tel: +33 1 69 08 12 80

b LPICM, CNRS/École polytechnique, Route de Saclay, Palaiseau cedex, France
E-mail: pere.roca@polytechnique.edu
Fax: +33 1 69 33 43 33
Tel: +33 1 69 33 43 14

c Laboratoire de Photonique et de Nanostructures, CNRS (UPR 20), Route de Nosay, Marcoussis, France
E-mail: Gilles.Patriarche@lpn.cnrs.fr
Fax: +33 1 69 63 60 06
Tel: +33 1 69 63 61 73

Abstract

In situ generation of indium catalyst droplets and subsequent growth of crystalline silicon nanowires on ITO by plasma-enhanced CVD are reported, and the wurtzite (Si–IV) phase is clearly evidenced in some wires.

Graphical abstract: In situ generation of indium catalysts to grow crystalline silicon nanowires at low temperature on ITO

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Article information

DOI
https://doi.org/10.1039/B813046A
Article type
Communication
Submitted
29 Jul 2008
Accepted
23 Sep 2008
First published
07 Oct 2008

J. Mater. Chem., 2008,18, 5187-5189

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In situ generation of indium catalysts to grow crystalline silicon nanowires at low temperature on ITO

P. Alet, L. Yu, G. Patriarche, S. Palacin and P. Roca i Cabarrocas, J. Mater. Chem., 2008, 18, 5187 DOI: 10.1039/B813046A

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