Jump to main content
Jump to site search

Issue 3, 2014
Previous Article Next Article

Parallelization of thermochemical nanolithography

Author affiliations

Abstract

One of the most pressing technological challenges in the development of next generation nanoscale devices is the rapid, parallel, precise and robust fabrication of nanostructures. Here, we demonstrate the possibility to parallelize thermochemical nanolithography (TCNL) by employing five nano-tips for the fabrication of conjugated polymer nanostructures and graphene-based nanoribbons.

Graphical abstract: Parallelization of thermochemical nanolithography

Back to tab navigation

Supplementary files

Publication details

The article was received on 25 Oct 2013, accepted on 24 Nov 2013 and first published on 29 Nov 2013


Article type: Communication
DOI: 10.1039/C3NR05696A
Author version available: Download Author version (PDF)
Citation: Nanoscale, 2014,6, 1299-1304
  •   Request permissions

    Parallelization of thermochemical nanolithography

    K. M. Carroll, X. Lu, S. Kim, Y. Gao, H. Kim, S. Somnath, L. Polloni, R. Sordan, W. P. King, J. E. Curtis and E. Riedo, Nanoscale, 2014, 6, 1299
    DOI: 10.1039/C3NR05696A

Search articles by author

Spotlight

Advertisements