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Issue 6, 2011
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Photo-assisted water oxidation with cobalt-based catalyst formed from thin-film cobalt metal on silicon photoanodes

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Abstract

Integrating chemical catalysts for water splitting with photoanode materials is a longstanding challenge in demonstrating light-assisted water oxidation, a process which can be used for the generation of solar fuels. In this work we use a silicon photoanode as a substrate for processing cobalt metal films to form a cobalt-based water oxidation catalyst (Co–Pi) integrated with the silicon photoanode. The Co–Pi coated photoanodes show catalytic onset at 0.85 V under illumination, which is better than silicon photoanodes coated with ITO and solution-deposited Co–Pi (catalytic onset at 1.05 V) and significantly better photoanodes with only ITO contacts (catalytic activity onset at 1.6 V).

Graphical abstract: Photo-assisted water oxidation with cobalt-based catalyst formed from thin-film cobalt metal on silicon photoanodes

  • This article is part of the themed collection: Solar energy
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Publication details

The article was received on 23 Feb 2011, accepted on 11 Apr 2011 and first published on 12 May 2011


Article type: Communication
DOI: 10.1039/C1EE01209F
Citation: Energy Environ. Sci., 2011,4, 2058-2061
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    Photo-assisted water oxidation with cobalt-based catalyst formed from thin-film cobalt metal on silicon photoanodes

    E. R. Young, R. Costi, S. Paydavosi, D. G. Nocera and V. Bulović, Energy Environ. Sci., 2011, 4, 2058
    DOI: 10.1039/C1EE01209F

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