Issue 1, 2022

Direct intercalation of MoS2 and WS2 thin films by vacuum filtration

Abstract

In the development of next-generation electronics and energy devices, intercalation compounds of transition metal dichalcogenides (TMDCs) are gaining attention for their unique properties that result from synergistic interactions between guest species and host materials. Nowadays, intercalation compounds of MoS2 and WS2 are commonly prepared by a two-step process: (1) exfoliation to form single-layer and/or few-layer nanosheets and (2) restacking the nanosheets with the guest species by vigorously mixing the exfoliated suspension with the solution of guest species. While a wide variety of intercalation compounds have been synthesized using this approach, the intercalation process is often time-consuming, and the product slurry limits material quality and impedes characterization and applications. Herein, we report a versatile method for preparing intercalated TMDCs in a thin-film morphology. Using this approach, we successfully prepared a range of existing intercalation compounds of MoS2 and WS2 (e.g., ferrocene and amine intercalated MoS2 and WS2). Additionally, by leveraging the versatility of this intercalation method, we intercalated phenazine and benzoquinone into MoS2 and WS2 for the first time.

Graphical abstract: Direct intercalation of MoS2 and WS2 thin films by vacuum filtration

Supplementary files

Article information

Article type
Communication
Submitted
29 7月 2021
Accepted
06 9月 2021
First published
15 9月 2021

Mater. Horiz., 2022,9, 360-367

Author version available

Direct intercalation of MoS2 and WS2 thin films by vacuum filtration

D. Kuo and B. M. Cossairt, Mater. Horiz., 2022, 9, 360 DOI: 10.1039/D1MH01193F

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