Issue 11, 2019

Large area metal micro-/nano-groove arrays with both structural color and anisotropic wetting fabricated by one-step focused laser interference lithography

Abstract

Artificial bioinspired surfaces are attracting increasing attention because of their fascinating characteristics, such as the structural color of a butterfly wing and the anisotropic wetting of a rice leaf. However, realization of the multicolor biomimetic metal surfaces with controlled anisotropy by using a simple, inexpensive and efficient method remains a challenge. Herein, we propose a focused laser interference lithography processing method, which has sufficient energy density and high processing efficiency to directly fabricate the groove structures on the metal surface. The surface is multicolor due to the diffraction grating effect of the regular groove structures, and exhibits anisotropic wetting due to its single-direction morphology. The influence of the observation angle on the diversity of colors and the anisotropic wetting under different heights and periods of grooves have been quantitatively investigated. A variety of patterns (e.g., leaf, crab, windmill, letter and so on) can be processed on various metals (e.g., stainless steel, Ti, Ni, Cu, Fe, Zn and so on) by this focused laser interference lithography because of its excellent flexibility and wide range of suitable materials. This multi-functional metal surface has broad applications in identification code, decorative beautification, anti-counterfeiting, information storage, bionic application design and so on.

Graphical abstract: Large area metal micro-/nano-groove arrays with both structural color and anisotropic wetting fabricated by one-step focused laser interference lithography

Supplementary files

Article information

Article type
Paper
Submitted
03 12月 2018
Accepted
12 2月 2019
First published
14 2月 2019

Nanoscale, 2019,11, 4803-4810

Large area metal micro-/nano-groove arrays with both structural color and anisotropic wetting fabricated by one-step focused laser interference lithography

H. Wu, Y. Jiao, C. Zhang, C. Chen, L. Yang, J. Li, J. Ni, Y. Zhang, C. Li, Y. Zhang, S. Jiang, S. Zhu, Y. Hu, D. Wu and J. Chu, Nanoscale, 2019, 11, 4803 DOI: 10.1039/C8NR09747J

To request permission to reproduce material from this article, please go to the Copyright Clearance Center request page.

If you are an author contributing to an RSC publication, you do not need to request permission provided correct acknowledgement is given.

If you are the author of this article, you do not need to request permission to reproduce figures and diagrams provided correct acknowledgement is given. If you want to reproduce the whole article in a third-party publication (excluding your thesis/dissertation for which permission is not required) please go to the Copyright Clearance Center request page.

Read more about how to correctly acknowledge RSC content.

Social activity

Spotlight

Advertisements