Issue 9, 2023

Facile synthesis of high-entropy alloy nanoparticles on germanane, Ge nanoparticles and wafers

Abstract

The unique solid-solution structure and multi-element compositions of high-entropy alloy nanoparticles (HEA NPs) have garnered substantial attention. Various methods have been developed to prepare a diverse array of HEA NPs using different substrates for support and stabilization. In this study, we present a facile surface-mediated reduction method to prepare HEA NPs (AuAgCuPdPt) decorated germanane (HEA NPs@GeNSs), and employ X-ray diffraction (XRD), Fourier-transform infrared spectroscopy (FTIR), X-ray photoelectron spectroscopy (XPS), and transmission electron microscopy (TEM) to characterize their structure, composition, and morphology. Subsequently, we demonstrate that the HEA NPs can be liberated from the surfaces of GeNSs as freestanding systems via straightforward exposure to UV light. We also explore germanium nanoparticles (GeNPs) as an alternative substrate for HEA NP formation/production, given their similarity to germanane and their Ge–H surface. Finally, we extend our investigation to bulk Ge wafers and demonstrate successful deposition of HEA NPs.

Graphical abstract: Facile synthesis of high-entropy alloy nanoparticles on germanane, Ge nanoparticles and wafers

Supplementary files

Article information

Article type
Communication
Submitted
09 5月 2023
Accepted
26 6月 2023
First published
27 6月 2023

Nanoscale Horiz., 2023,8, 1217-1225

Facile synthesis of high-entropy alloy nanoparticles on germanane, Ge nanoparticles and wafers

C. Ni, K. M. O’Connor, J. Trach, C. Butler, B. Rieger and J. G. C. Veinot, Nanoscale Horiz., 2023, 8, 1217 DOI: 10.1039/D3NH00178D

To request permission to reproduce material from this article, please go to the Copyright Clearance Center request page.

If you are an author contributing to an RSC publication, you do not need to request permission provided correct acknowledgement is given.

If you are the author of this article, you do not need to request permission to reproduce figures and diagrams provided correct acknowledgement is given. If you want to reproduce the whole article in a third-party publication (excluding your thesis/dissertation for which permission is not required) please go to the Copyright Clearance Center request page.

Read more about how to correctly acknowledge RSC content.

Social activity

Spotlight

Advertisements