Open Access Article
Wenjing
Li
ab,
Tianyi
Lin
ab,
Feng
Zhu
*ab and
Donghang
Yan
ab
aState Key Laboratory of Polymer Science and Technology, Changchun Institute of Applied Chemistry, Chinese Academy of Sciences, Changchun 130022, China. E-mail: zhufeng@ciac.ac.cn
bSchool of Applied Chemistry and Engineering, University of Science and Technology of China, Hefei 230026, China
First published on 22nd July 2025
In crystalline organic light-emitting diodes (C-OLEDs), the interfacial energy level matching between the amorphous electron transport layer (ETL) and the crystalline emitting layer (EML) is of vital importance for the charge injection efficiency and device performance. In traditional studies, the bulk highest occupied molecular orbital (HOMO)/lowest unoccupied molecular orbital (LUMO) energy levels of a single material are often determined using cyclic voltammetry (CV), and these values are employed to indicate the materials’ energy levels in OLEDs. However, this method neglects key factors such as interface energy level bending or offset, which could greatly influence crystalline material interfaces. In this study, taking blue-light 2FPPICz:BPPI C-OLED as the model system and selecting five typical electron transport materials including TmPyPB, TPBI, and Bphen as the amorphous ETL, the key differences in interfacial energy level characterization are revealed through multi-dimensional methods. By comparing the bulk energy levels of the amorphous ETL determined using CV and the interfacial energy levels of the crystalline EML/amorphous ETL measured using ultraviolet photoelectron spectroscopy (UPS), it is found that there is a significant difference between the molecular energy levels measured by CV and the actual interfacial energy levels in C-OLEDs, leading to an obvious deviation between the actual external quantum efficiency (EQE) of the device and the expected value. For example, CV shows that the bulk LUMO and HOMO of Bphen match with that of the EML, but UPS measures an interfacial energy level mismatch, resulting in a maximum external quantum efficiency of only 1.70% for the device, which is much lower than the theoretical expectation. In contrast, although CV shows a large energy difference between the bulk LUMO of TPBI and the EML, UPS measures well-matched interfacial energy levels with only a 0.09 eV energy difference, achieving a high EQE of 5.98%. The research results indicate that interfacial energy level analysis based on UPS can precisely describe the interface physics, guide energy level optimization and improve the luminous efficiency of C-OLEDs. This work proves a necessary characterization paradigm for interface engineering of organic crystalline optoelectronic devices, especially crystalline OLEDs.
In traditional research, the energy level assessment of ETL materials often relies on cyclic voltammetry (CV),13 which calculates the highest occupied molecular orbital (HOMO) and lowest unoccupied molecular orbital (LUMO) energy levels of the materials based on their redox potentials.14 However, such methods can only reflect the bulk phase energy level characteristics of the materials and cannot directly describe the interface energy level arrangement differences between the ETL and EML in the actual working state of the C-OLEDs. This limitation may lead to significant deviations between theoretical design and actual device performance, such as unpredictable interface charge injection barriers or intensified exciton quenching effects, ultimately restricting the improvement of device efficiency and lifetime.15
Ultraviolet photoelectron spectroscopy (UPS)16 technology provides more reliable experimental evidence for revealing the interface energy level relationships in real devices due to its ability to directly measure the work function, and band bending characteristics of materials in the film state.17,18 However, the energy level selection criteria and interface engineering for ETL materials in C-OLEDs still widely rely on CV data in the bulk phase, and the practical interfacial physical image obtained via UPS has not been systematically explored.
This study uses typical blue light 2-(4-(9H-carbazol-9-yl)phenyl)-1-(3,5-difluorophenyl)-1H-phenanthro[9,10-d]imidazole (2FPPICz):4,4′-bis-)1-phenyl-phenanthro[9,10-d]imidazol-2-yl)biphenyl (BPPI) C-OLEDs8 as a model system. By comparing the bulk phase energy levels (via CV) and interface energy levels (via UPS) of five ETL materials (1,3,5-tri[(3 -pyridyl)-phen-3-yl]benzene (TmPyPB),19 1,3,5-tri(1-phenyl-1H-benzo[d]imidazol-2-yl)phenyl (TPBI),20etc.), we reveal the limitations of the traditional CV method in ETL energy level assessment. Experiments show that the correlation between the ΔLUMO (LUMO energy level difference between EML and ETL interfaces) obtained based on UPS and the C-OLED efficiency is significantly better than that predicted using the CV method. For example, although the CV method shows that the bulk phase LUMO of 4,7-diphenyl-1,10-phenanthroline (Bphen)21 matches well with the EML, the interface energy level mismatch exposed by UPS testing directly leads to a very low device efficiency, of which the maximum external quantum efficiency (EQEmax) = 1.70%. This discovery not only challenges the traditional energy level selection paradigm but also emphasizes the core position of interface energy level engineering in the design of C-OLEDs. This work provides new methodological guidance for the optimization of transport layers in high-performance C-OLEDs.
Fig. 1 shows the UV-vis absorption spectra of 2FPPICz:BPPI crystalline thin film and five electron transport layers (ETLs). The absorption edge wavelength of 2FPPICz:BPPI, BmPyPhB, TPBI, TmPyPB, Be(pp)2 and Bphen are 384 nm, 311 nm, 352 nm, 307 nm, 406 nm and 405 nm, respectively. Meanwhile, the UV-vis absorption spectrum of the amorphous 2FPPICz:BPPI thin film was also measured and is presented in Fig. S2 (ESI†). Consistent with previously reported findings, the ordered molecular arrangement in the crystalline thin film leads to distinct energy levels and excited state distributions between the crystalline and amorphous phases. This difference causes the absorption edge (399 nm) of the amorphous thin film to exhibit a certain degree of red-shift compared to that of the crystalline thin film.26,27 According to formula (1),28 the optical bandgap (Eg) can be estimated.
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| Fig. 1 UV-vis absorption spectra of the 2FPPICz:BPPI crystalline thin film and BmPyPhB, TPBI, TmPyPB, Be(pp)2 and Bphen amorphous thin films. | ||
| Material | E g (eV) |
|---|---|
| 2FPPICz:BPPI | 3.23 |
| TPBI | 3.52 |
| BmPyPhB | 3.99 |
| TmPyPB | 4.04 |
| Be(pp)2 | 3.05 |
| Bphen | 3.06 |
We fabricated the following structure of thin films for UPS testing. Indium tin oxide(ITO)/poly(3,4-ethylenedioxythiophene):poly(styrenesulfonate) (PEDOT:PSS)/2,5-di([1,1′-biphenyl]-4-yl)thiophene (BP1T) (7 nm)/2FPPICz (10 nm)/2FPPICz:BPPI (6% 20 nm) and ITO/PEDOT:PSS/BP1T (7 nm)/2FPPICz (10 nm)/2FPPICz:BPPI (6% 20 nm)/ETLs (0.2 nm, 0.5 nm, 1 nm, 5 nm). ETLs consist of BmPyPhB, TPBI, TmPyPB, Be(pp)2 and Bphen these five materials. Fig. 2 and 3 show the UPS characterization and schematic energy level diagrams of 2FPPICz:BPPI crystalline thin film and ETLs (BmPyPhB, TPBI, TmPyPB, Be(pp)2 and Bphen) organic heterojunction. “0 nm” curve of Fig. 2a shows the high binding energy cut-off (HBEC) of the 2FPPICz:BPPI crystalline thin film. “0 nm” curve of Fig. 2b represents the HOMO of 2FPPICz:BPPI crystalline thin film. Based on the work function of the reference electrode Au being 5.0 eV in the test, combined with the Eg value of the 2FPPICz:BPPI crystalline film being 3.23 eV, it can be concluded that the HOMO and the LUMO of 2FPPICz:BPPI crystalline thin film is 5.84 eV and 2.61 eV, respectively. Among them, as the thickness of the amorphous films of TPBI and TmPyPB increases, the position of HBEC shifts towards higher energy. This indicates that the vacuum energy level (VL) of the interface between the crystalline film of 2FPPICz:BPPI and these two ETL amorphous films has shifted. The HBEC of other three ETLs do not shift with the increase of thickness, indicating that their vacuum energy levels have not shifted. As the thickness of ETLs increases, the HOMO of the five ETLs all show a shift towards higher energy. This indicates that the HOMO energy levels of ETLs bend downward from the interface to the bulk phase, i.e. interfacial heterojunction effect exists. HOMO of TPBI, BmPyPhB, TmPyPB, Be(pp)2 and Bphen (bulk phase) are 6.50 eV, 6.35 eV, 6.32 eV, 6.47 eV and 6.18 eV, respectively. Based on the Eg values of the five ETLs, their LUMOs were calculated. The LUMO (bulk phase) of TPBI, BmPyPhB, TmPyPB, Be(pp)2 and Bphen are 2.98 eV, 2.36 eV, 2.28 eV, 3.42 eV and 3.12 eV, respectively. Based on the HOMO information of 0.2 nm thickness ETLs, we obtained the LUMO of five kinds of ETLs at the interface. Among them, LUMOs (at 0.2 nm) of TPBI, BmPyPhB, TmPyPB, Be(pp)2 and Bphen are 2.52 eV, 2.08 eV, 2.18 eV, 3.27 eV and 3.08 eV, respectively. Therefore, by comparing the two sets of results, we can conclude that the results obtained from the CV test alone can only represent the energy level information of the material itself. As for the actual energy level arrangement of the interface contact, it needs to be determined via the UPS test method.
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| Fig. 2 UPS characterization and schematic energy level diagram of the 2FPPICz:BPPI crystalline film and ETL organic heterojunction (a)–(c) TPBI (d)–(f) BmPyPhB (g)–(i) TmPyPB. | ||
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| Fig. 3 UPS characterization and schematic energy level diagram of the 2FPPICz:BPPI crystalline film and ETL organic heterojunction (a)–(c) Be(pp)2 (d)–(f) Bphen. | ||
ITO/PEDOT:PSS/BP1T(7 nm)/2FPPICz(10 nm)/2FPPICz:BPPI (20 nm 6%)/ETLs (40 nm)/LiF (1 nm)/Al (120 nm). Crystalline thin films are fabricated through the WEG method.27,32–34 BP1T is the inducing layer of the crystalline thin film.35 2FPPICz is the crystalline hole transport layer (HTL), and 2FPPICz:BPPI is the crystalline emitting layer (EML). The inducing layer, HTL and EML were all deposited at a base temperature of 102 °C. According to previous studies,8 the crystalline light-emitting layer 2FPPICz:BPPI is a crystalline organic solid solution (non-stoichiometric multicomponent crystal) thin film, in which 2FPPICz and BPPI are co-doped at different mass ratios. The pure 2FPPICz thin film exhibits smooth strip-like crystals, and BPPI molecules are doped into the crystalline framework of the host 2FPPICz via a substitutional mechanism. Notably, the incorporation of BPPI molecules does not disrupt the crystalline framework of the 2FPPICz thin film. The ETLs TPBI, BmPyPhB, TmPyPB, Be(pp)2 and Bphen amorphous thin films were deposited at a base room-temperature. Fig. 4a presents the schematic diagram of the principle of C-OLEDs. The device consists of three simple parts, namely HTL, EML and ETL. A bias voltage is applied between the cathode Al and the anode ITO. Holes and electrons are respectively injected into the EML from the anode and the cathode, forming excitons and generating light emission. Fig. 4b presents the chemical formulas of all the materials used in this paper.
Fig. 5 depicts the device performance of C-OLEDs using different ETLs. Fig. 5a shows the current density (J)–voltage (V)–luminance (L) curve. Fig. 5b presents the electroluminescence (EL) spectra. All the C-OLEDs fabricated with the five ETLs emit blue light with a peak around 450 nm. Fig. 5c presents the curves of current efficiency (CE) and luminance. Among them, the maximum current efficiencies (CEmax) of TmPyPB, TPBI, BmPyPhB, Be(pp)2 and Bphen are 5.50 cd A−1, 5.12 cd A−1, 4.66 cd A−1, 3.20 cd A−1 and 1.93 cd A−1, respectively. Fig. S2 (ESI†) presents the curves of power efficiency (PE) and luminance. Among them, the maximum power efficiency (PEmax) of TmPyPB, TPBI, BmPyPhB, Be(pp)2 and Bphen are 5.42 lm W−1, 5.15 lm W−1, 4.57 lm W−1, 3.25 lm W−1 and 2.02 lm W−1, respectively. Fig. 5d presents the curves of external quantum efficiency (EQE) vs. luminance. Among them, the EQEmax of TPBI, BmPyPhB, TmPyPB, Be(pp)2 and Bphen from the largest to the smallest are 5.98%, 5.19%, 5.10%, 3.57% and 1.70%, respectively.
Based on UPS test results and the performance results of C-OLEDs, we conducted an analysis. In Fig. 6, the relationship between the ETL thickness and the LUMO and HOMO is presented, as well as the relationship between ΔLUMO (the difference in LUMO energy levels between the EML and the ETLs at the interface) and the current efficiency (left) and external quantum efficiency (right) of C-OLEDs at 100 cd m−2 and 1000 cd m−2 luminance levels are shown respectively. Fig. 6a demonstrates that, starting from the EML interface of 2FPPICz:BPPI (0 nm thickness), the LUMO energy levels of the five electron transport layers exhibit variations with increasing ETL thickness. At 0.2 nm thickness, the LUMO energy levels of BmPyPhB, TmPyPB and TPBI are higher than the LUMO of the 2FPPICz:BPPI crystalline surface. Among them, the interface potential barriers ΔLUMO (ΔLUMO = LUMO(EML) − LUMO(ETL)) of BmPyPhB, TmPyPB and TPBI are −0.53 eV, −0.43 eV and −0.09 eV respectively. The EQEmax of C-OLEDs fabricated using BmPyPhB, TmPyPB and TPBI are 5.19%, 5.10% and 5.98% respectively. At 0.2 nm, the LUMO of the interface of Be(pp)2 and Bphen materials is lower than that of the EML in the crystalline state, and the ΔLUMO values are 0.66 eV and 0.47 eV respectively. The EQEmax of C-OLEDs fabricated using Be(pp)2 and Bphen are 3.57% and 1.70%, respectively. It can be seen that when the LUMO of ETL at the interface is higher than that of the crystalline EML, it is beneficial for C-OLED to achieve a higher external quantum efficiency. Fig. 6b illustrates the changes in the HOMO positions of the five kinds of ETLs as their thicknesses increase. When the ETL thickness is 5 nm, the bulk phase HOMOs of TPBI, TmPyPB, BmPyPhB, Be(pp)2 and Bphen are 6.50 eV, 6.32 eV, 6.35 eV, 6.47 eV and 6.18 eV respectively. Since the absolute value of the difference between the HOMO of Bphen and the HOMO of the EML is the smallest, the EQEmax of the C-OLED with Bphen ETL is the lowest, reaching 1.70%. Fig. 6c and d illustrate the ΔLUMO dependence of the current efficiency (left) and external quantum efficiency (right) of C-OLEDs at the luminance levels of 100 cd m−2 (Fig. 6c) and 1000 cd m−2 (Fig. 6d). Summarizing the information we had obtained previously, the LUMO data in Fig. 6a and d were obtained through UPS testing. LUMO data in Fig. 6e and f were derived from Fig. S1 (ESI†) and measured using the CV method. It can be observed that the relationship between the performance of the C-OLED and the LUMO energy level (the CV method) is irregular. Therefore, when regulating the performance of C-OLED, using only the CV method to determine the energy level matching is inaccurate.
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| Fig. 6 The relationship between the ETL thickness and (a) LUMO and (b) HOMO. The relationship between ΔLUMO (the energy level difference between EML and ETLs) and current efficiency and external quantum efficiency @ (c) 100cd m−2 (d) 1000cd m−2. LUMOs of (a)–(d) were measured using UPS. (e) The relationship between the ETL thickness and LUMO, (f) relationship between ΔLUMO and EQEmax. The LUMO of (e) and (f) were measured by CV, data from ref. 21, 24, 25, 34 and 36. | ||
The organic semiconductor device was fabricated via physical vacuum deposition. ITO substrates were then transferred to a vacuum evaporation device chamber for device evaporation at a vacuum of 10−4 after the above treatment. Organic crystalline films are BP1T, 2FPPICz, and 2FPPICz:BPPI. A BP1T layer is an induced layer, while a 2FPPICz pure layer is an epitaxial crystalline layer. 2FPPICz:BPPI (6%) is the OSS EML. The preparation of BP1T,2FPPICz and 2FPPICz:BPPI layer adopts a similar WEG method reported previously.32 All of the ETLs used in this article are amorphous thin films. The substrate temperatures for fabricating crystalline organic and amorphous thin films are 102 °C and room temperature, respectively. When evaporating organic layer and LiF, the substrate rotation speed is 450 r.p.m. The deposition rates of BP1T and 2FPPICz are about 4–10 Å min−1. The deposition rates of the 2FPPICz:BPPI layer of 2FPPICz and BPPI are 10 Å min−1 and 0.2–1.0 Å min−1 respectively. The deposition rates of BmPyPhB, TPBI, TmPyPB, Be(pp)2 and Bphen are 1–2 Å s−1 at room temperature. The deposition rate of LiF and Al are 3–5 Å min−1 and 10–15 Å s−1 at room temperature, respectively. A quartz-crystal microbalance was used for monitoring the film thickness. The area of device emission is determined by the intersection between the anode (ITO) and cathode (Al) (that is 4 mm × 4 mm).
Footnote |
| † Electronic supplementary information (ESI) available: Fig. S1–S3. See DOI: https://doi.org/10.1039/d5tc01782c |
| This journal is © The Royal Society of Chemistry 2025 |