Issue 7, 2024

Interface of gallium-based liquid metals: oxide skin, wetting, and applications

Abstract

Gallium-based liquid metals (GaLMs) are promising for a variety of applications-especially as a component material for soft devices-due to their fluidic nature, low toxicity and reactivity, and high electrical and thermal conductivity comparable to solid counterparts. Understanding the interfacial properties and behaviors of GaLMs in different environments is crucial for most applications. When exposed to air or water, GaLMs form a gallium oxide layer with nanoscale thickness. This “oxide nano-skin” passivates the metal surface and allows for the formation of stable microstructures and films despite the high-surface tension of liquid metal. The oxide skin easily adheres to most smooth surfaces. While it enables effective printing and patterning of the GaLMs, it can also make the metals challenging to handle because it adheres to most surfaces. The oxide also affects the interfacial electrical resistance of the metals. Its formation, thickness, and composition can be chemically or electrochemically controlled, altering the physical, chemical, and electrical properties of the metal interface. Without the oxide, GaLMs wet metallic surfaces but do not wet non-metallic substrates such as polymers. The topography of the underlying surface further influences the wetting characteristics of the metals. This review outlines the interfacial attributes of GaLMs in air, water, and other environments and discusses relevant applications based on interfacial engineering. The effect of surface topography on the wetting behaviors of the GaLMs is also discussed. Finally, we suggest important research topics for a better understanding of the GaLMs interface.

Graphical abstract: Interface of gallium-based liquid metals: oxide skin, wetting, and applications

Article information

Article type
Review Article
Submitted
13 2月 2024
Accepted
30 4月 2024
First published
01 5月 2024

Nanoscale Horiz., 2024,9, 1099-1119

Interface of gallium-based liquid metals: oxide skin, wetting, and applications

J. Kim, S. Kim, M. D. Dickey, J. So and H. Koo, Nanoscale Horiz., 2024, 9, 1099 DOI: 10.1039/D4NH00067F

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