Issue 4, 2024

Polymerization of monomer aggregates for tailoring and patterning water wettability

Abstract

An approach of 'polymerization of monomers in its aggregated form' is unprecedentedly introduced to (i) tailor the water wettability of fibrous and porous substrates from hydrophobicity to superhydrophobicity, and (ii) associate patterned wettability. A solution of selected monomers—i.e., alkyl acrylate in a good solvent (indicating high solubility; ethanol) was transferred into a bad solvent (refers to poor solubility; water) to achieve a stable dispersion of monomer aggregates of size <1 μm for deposition on fibrous and porous substrates. Its photopolymerization provided a durable coating with the ability to tailor the water wettability from 134° to 153°. Furthermore, a spatially selective photopolymerization process yielded a patterned interface of superhydrophilicity and superhydrophobicity. Such a facile chemical approach with the ability to provide a durable coating embedded with tailored and patterned wettability would be useful for various potential applications.

Graphical abstract: Polymerization of monomer aggregates for tailoring and patterning water wettability

Supplementary files

Article information

Article type
Communication
Submitted
20 10月 2023
Accepted
01 12月 2023
First published
04 12月 2023

Chem. Commun., 2024,60, 444-447

Polymerization of monomer aggregates for tailoring and patterning water wettability

M. Dhar, C. Mishra, A. Das and U. Manna, Chem. Commun., 2024, 60, 444 DOI: 10.1039/D3CC05172B

To request permission to reproduce material from this article, please go to the Copyright Clearance Center request page.

If you are an author contributing to an RSC publication, you do not need to request permission provided correct acknowledgement is given.

If you are the author of this article, you do not need to request permission to reproduce figures and diagrams provided correct acknowledgement is given. If you want to reproduce the whole article in a third-party publication (excluding your thesis/dissertation for which permission is not required) please go to the Copyright Clearance Center request page.

Read more about how to correctly acknowledge RSC content.

Social activity

Spotlight

Advertisements