Issue 83, 2023
From the journal:

Chemical Communications

Deposition of a high entropy thin film by aerosol-assisted chemical vapor deposition†

Weichen Xiao, ORCID logo a   Mark A. Buckingham, ORCID logo a   Yi Li, ORCID logo a   Kerry Hazeldine,b   Bing Han,a   Sarah H. Cartmell,a   Alexander S. Eggeman,a   Alex S. Walton ORCID logo b  and  David J. Lewis ORCID logo *a  

* Corresponding authors

a Department of Materials, The University of Manchester, Manchester M13 9PL, UK
E-mail: david.lewis-4@manchester.ac.uk

b Department of Chemistry and the Photon Science Institute, The University of Manchester, Oxford Road, Manchester, UK

Abstract

Herein we report for the first time the synthesis of a high entropy (CuZnCoInGa)S metal sulfide thin film deposited by AACVD using molecular precursors.

Graphical abstract: Deposition of a high entropy thin film by aerosol-assisted chemical vapor deposition

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Article information

DOI
https://doi.org/10.1039/D3CC03205A
Article type
Communication
Submitted
03 7月 2023
Accepted
26 9月 2023
First published
27 9月 2023
This article is Open Access
Creative Commons BY license

Chem. Commun., 2023,59, 12427-12430

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Deposition of a high entropy thin film by aerosol-assisted chemical vapor deposition

W. Xiao, M. A. Buckingham, Y. Li, K. Hazeldine, B. Han, S. H. Cartmell, A. S. Eggeman, A. S. Walton and D. J. Lewis, Chem. Commun., 2023, 59, 12427 DOI: 10.1039/D3CC03205A

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