Issue 10, 2023

Layered polymer composite foams for broadband ultra-low reflectance EMI shielding: a computationally guided fabrication approach

Abstract

The development of layered polymer composites and foams offers a promising solution for achieving effective electromagnetic interference (EMI) shielding while minimizing secondary electromagnetic pollution. However, the current fabrication process is largely based on trial and error, with limited focus on optimizing geometry and microstructure. This often results in suboptimal electromagnetic wave reflection and the use of unnecessarily thick samples. In this study, an input impedance model was employed to guide the fabrication of layered PVDF composite foams. This approach optimized the void fraction (VF) and the thickness of each layer to achieve broadband low reflection. Moreover, hybrid heterostructures of SiCnw@MXene were incorporated into the PVDF composite foams as an absorption layer, while the conductive PVDF/CNT composite foams served as a shielding layer. Directed by theoretical computations, we found that combining 2.2 mm of PVDF/SiCnw@MXene composite foam (50% VF) and 1.6 mm of PVDF/CNT composite yielded EMI shielding effectiveness of 45 dB, with an average reflectivity (R) of 0.03 and an effective absorption bandwidth of 5.54 GHz (for R < 0.1) over the Ku-band (12.4–18 GHz). Importantly, the corresponding peak R was only 0.000017. Our work showcases a theoretically guided approach for developing absorption-dominant EMI shielding materials with broadband ultra-low reflection, paving the way for cutting-edge applications.

Graphical abstract: Layered polymer composite foams for broadband ultra-low reflectance EMI shielding: a computationally guided fabrication approach

Supplementary files

Article information

Article type
Communication
Submitted
26 ⵉⴱⵔ 2023
Accepted
06 ⵢⵓⵍ 2023
First published
07 ⵢⵓⵍ 2023

Mater. Horiz., 2023,10, 4423-4437

Layered polymer composite foams for broadband ultra-low reflectance EMI shielding: a computationally guided fabrication approach

L. Ma, L. Wei, M. Hamidinejad and C. B. Park, Mater. Horiz., 2023, 10, 4423 DOI: 10.1039/D3MH00632H

To request permission to reproduce material from this article, please go to the Copyright Clearance Center request page.

If you are an author contributing to an RSC publication, you do not need to request permission provided correct acknowledgement is given.

If you are the author of this article, you do not need to request permission to reproduce figures and diagrams provided correct acknowledgement is given. If you want to reproduce the whole article in a third-party publication (excluding your thesis/dissertation for which permission is not required) please go to the Copyright Clearance Center request page.

Read more about how to correctly acknowledge RSC content.

Social activity

Spotlight

Advertisements