Issue 47, 2021

Synthesis of 2D semiconducting single crystalline Bi2S3 for high performance electronics

Abstract

2-Dimensional (2D) semiconducting materials are attractive candidates for future electronic device applications due to the tunable bandgap, transparency, flexibility, and downscaling to the atomic level in material size and thickness. However, 2D materials have critical issues regarding van der Waals contact, interface instability and power consumption. In particular, the development of semiconducting electronics based on 2D materials is significantly hindered by a low charge-carrier mobility. In order to improve the critical shortcoming, diverse efforts have been made in synthesis and device engineering. Here, we propose a synthesis method of single crystalline 2D Bi2S3 by chemical vapor deposition for high performance electronic device applications. The ion-gel gated field effect transistor with the as-grown Bi2S3 on the SiO2 substrate exhibits a high mobility of 100.4 cm2 V−1 S−1 and an on–off current ratio of 104 under a low gate voltage below 4 V at room temperature without chemical doping and surface engineering. The superior performance is attributed to the high crystal quality of Bi2S3 that shows low sulfur vacancies and atomic ratio close to the ideal value (2 : 3) under a rich sulfur growth process using H2S gas instead of sulfur powder. The synthesis method will provide a platform to realize high performance electronics and optoelectronics based on 2D semiconductors.

Graphical abstract: Synthesis of 2D semiconducting single crystalline Bi2S3 for high performance electronics

Article information

Article type
Paper
Submitted
19 ⵖⵓⵛ 2021
Accepted
04 ⵏⵓⵡ 2021
First published
04 ⵏⵓⵡ 2021

Phys. Chem. Chem. Phys., 2021,23, 26806-26812

Synthesis of 2D semiconducting single crystalline Bi2S3 for high performance electronics

Y. Kim, E. Jeong, M. Joe and C. Lee, Phys. Chem. Chem. Phys., 2021, 23, 26806 DOI: 10.1039/D1CP03815J

To request permission to reproduce material from this article, please go to the Copyright Clearance Center request page.

If you are an author contributing to an RSC publication, you do not need to request permission provided correct acknowledgement is given.

If you are the author of this article, you do not need to request permission to reproduce figures and diagrams provided correct acknowledgement is given. If you want to reproduce the whole article in a third-party publication (excluding your thesis/dissertation for which permission is not required) please go to the Copyright Clearance Center request page.

Read more about how to correctly acknowledge RSC content.

Social activity

Spotlight

Advertisements