Issue 5, 2017

Size effect of the active sites in UiO-66-supported nickel catalysts synthesized via atomic layer deposition for ethylene hydrogenation

Abstract

Ni(II) ions have been deposited on the Zr6 nodes of a metal–organic framework (MOF), UiO-66, via an ALD-like process (ALD = atomic layer deposition). By varying the number of ALD cycles, three Ni-decorated UiO-66 materials were synthesized. A suite of physical methods has been used to characterize these materials, indicating structural and high-surface-area features of the parent MOF are retained. Elemental analysis via X-ray photoelectron spectroscopy (XPS) indicates that the anchored Ni ions are mainly on surface and near-surface MOF defect sites. Upon activation, all three materials are catalytic for ethylene hydrogenation, but their catalytic activities significantly vary, with the largest clusters displaying the highest per-nickel-atom activity. The study highlights the ease and effectiveness of ALD in MOFs (AIM) for synthesizing, specifically, UiO-66-supported NiyOx catalysts.

Graphical abstract: Size effect of the active sites in UiO-66-supported nickel catalysts synthesized via atomic layer deposition for ethylene hydrogenation

Supplementary files

Article information

Article type
Research Article
Submitted
28 ⵉⵏⵏ 2017
Accepted
22 ⴱⵕⴰ 2017
First published
09 ⵎⴰⵕ 2017

Inorg. Chem. Front., 2017,4, 820-824

Size effect of the active sites in UiO-66-supported nickel catalysts synthesized via atomic layer deposition for ethylene hydrogenation

Z. Li, A. W. Peters, J. Liu, X. Zhang, N. M. Schweitzer, J. T. Hupp and O. K. Farha, Inorg. Chem. Front., 2017, 4, 820 DOI: 10.1039/C7QI00056A

To request permission to reproduce material from this article, please go to the Copyright Clearance Center request page.

If you are an author contributing to an RSC publication, you do not need to request permission provided correct acknowledgement is given.

If you are the author of this article, you do not need to request permission to reproduce figures and diagrams provided correct acknowledgement is given. If you want to reproduce the whole article in a third-party publication (excluding your thesis/dissertation for which permission is not required) please go to the Copyright Clearance Center request page.

Read more about how to correctly acknowledge RSC content.

Social activity

Spotlight

Advertisements