Cross Reference Logo
Citations to this article as recorded by CrossRef and RSC Journals (25 citations).

Zhengran He, Ziyang Zhang, Kyeiwaa Asare-Yeboah and Sheng Bi
Mater. Adv., 2023, 4, 769
DOI: 10.1039/D2MA00726F

Ritobrata De and Santanu Kumar Pal
Chem. Commun., 2023, 59, 3050
DOI: 10.1039/D2CC06763C

Li Sun, Tianyu Li, Jiajian Zhou, Wenhao Li, Zhongming Wu, Ruikun Niu, Jinxiang Cheng, Kyeiwaa Asare‐Yeboah and Zhengran He
ChemistrySelect, 2023, 8
DOI: 10.1002/slct.202203927

Riya Pathak, Gopinathan Anoop and Shibnath Samanta
J. Compos. Sci., 2025, 9, 71
DOI: 10.3390/jcs9020071

Amnahir Peña‐Alcántara, Shayla Nikzad, Lukas Michalek, Nathaniel Prine, Yunfei Wang, Huaxin Gong, Elisa Ponte, Sebastian Schneider, Yilei Wu, Samuel E. Root, Mingqian He, Jeffrey B.‐H. Tok, Xiaodan Gu and Zhenan Bao
Adv Elect Materials, 2023, 9
DOI: 10.1002/aelm.202201055

Zhengran He, Kyeiwaa Asare-Yeboah and Sheng Bi
Discov Electron, 2025, 2
DOI: 10.1007/s44291-025-00067-w

Sheng Bi, Zehui Yao, Xu Han, Congjie Bi, Xiaolong Wang, Qiangqiang Chen, Yao Wang, Rongyi Wang, Kyeiwaa Asare-Yeboah, Zhengran He and Ruonan Song
Electron. Mater. Lett., 2024, 20, 711
DOI: 10.1007/s13391-024-00510-2

Yaşar Aslan, Halil Seymen, Niyazi Berk and Şükrü Karataş
CCS, 2022, 2, 472
DOI: 10.2174/2210298102666220607150102

Zhengran He, Kyeiwaa Asare-Yeboah and Sheng Bi
Coatings, 2024, 14, 1080
DOI: 10.3390/coatings14091080

Joel Ndikumana, Jiho Kim, Jun Young Kim, Dongjin Lee and Kunsik An
Flex. Print. Electron., 2023, 8, 023001
DOI: 10.1088/2058-8585/acd263

Erica Zeglio, Yazhou Wang, Saumey Jain, Yunfan Lin, Alan Eduardo Avila Ramirez, Kui Feng, Xugang Guo, Helena Ose, Gatis Mozolevskis, Damia Mawad, Wan Yue, Mahiar Max Hamedi and Anna Herland
Advanced Materials, 2024, 36
DOI: 10.1002/adma.202302624

K Hasanirokh, F Naderi and H Mohammadpour
J. Phys.: Condens. Matter, 2023, 35, 295702
DOI: 10.1088/1361-648X/accbf7

Jiongye Gao, Bin Zhang, Qibo Feng, Xu Shen, Yong Xue and Jiacheng Liu
Sensors, 2023, 23, 2724
DOI: 10.3390/s23052724

Shahidul Alam, Christopher E Petoukhoff, José P Jurado, Haya Aldosari, Xinyu Jiang, Tomáš Váry, Hamza Al Nasser, Amr Dahman, Wejdan Althobaiti, Sandra P Gonzalez Lopez, Wejdan Alsufyani, Peter Müller-Buschbaum, Vojtech Nádaždy, Harald Hoppe and Frédéric Laquai
J. Phys. Energy, 2024, 6, 025013
DOI: 10.1088/2515-7655/ad2498

Zhengran He, Kyeiwaa Asare-Yeboah and Sheng Bi
Electronics, 2025, 14, 3042
DOI: 10.3390/electronics14153042

Ruonan Song, Zehui Yao, Yining Jiang, Sheng Bi, Junxiu Piao, Zitian Zhang, Xu Han, Xiaoran Yang, Congjie Bi, Kyeiwaa Asare-Yeboah and Zhengran He
Organic Electronics, 2025, 146, 107315
DOI: 10.1016/j.orgel.2025.107315

Xiaojiao Yuan, Kunran Yang, Chloé Grazon, Cong Wang, Lorenzo Vallan, Jean‐David Isasa, Pedro M. Resende, Fanxing Li, Cyril Brochon, Hynd Remita, Georges Hadziioannou, Eric Cloutet and Jian Li
Angew Chem Int Ed, 2024, 63
DOI: 10.1002/anie.202315333

Wenyan Zhang, Hangmin Guan, Yingfei Hu, Wei Wang, Fei Liu, Xiaoli Yang and Lingyun Hao
CCS, 2023, 3, 293
DOI: 10.2174/2210298103666230406095730

Zhengran He, Kyeiwaa Asare-Yeboah and Sheng Bi
Discov Electron, 2024, 1
DOI: 10.1007/s44291-024-00039-6

Zhengran He, Sheng Bi and Kyeiwaa Asare-Yeboah
Coatings, 2025, 15, 164
DOI: 10.3390/coatings15020164

Zhengran He, Ziyang Zhang, Kyeiwaa Asare-Yeboah and Sheng Bi
Electron. Mater. Lett., 2022, 18, 501
DOI: 10.1007/s13391-022-00370-8

Xiaojiao Yuan, Kunran Yang, Chloé Grazon, Cong Wang, Lorenzo Vallan, Jean‐David Isasa, Pedro M. Resende, Fanxing Li, Cyril Brochon, Hynd Remita, Georges Hadziioannou, Eric Cloutet and Jian Li
Angewandte Chemie, 2024, 136
DOI: 10.1002/ange.202315333

Maria Elisabetta Giglio, Elisabetta Colantoni, Ilaria Fratelli, Carme Martinez‐Domingo, Pedro Martinez‐Zaragoza, Giulia Napolitano, Enrico Campari, Paolo Branchini, Beatrice Fraboni, Laura Basiricó, Luca Tortora and Marta Mas‐Torrent
Adv Elect Materials, 2025
DOI: 10.1002/aelm.202400887

Zhengran He, Sheng Bi and Kyeiwaa Asare-Yeboah
Processes, 2024, 12, 1944
DOI: 10.3390/pr12091944

Jinyeob Kim, Junyeop Yoo, Jiseong Oh, Hyunjung Kim, Sejoong Kim, Dongil Ho and Choongik Kim
Surfaces and Interfaces, 2025, 72, 107340
DOI: 10.1016/j.surfin.2025.107340