Issue 16, 2022

Single-cell patterning regulation by physically modified silicon nanostructures

Abstract

Chemically and biologically modified substrates for single-cell patterning have been studied extensively, but physically modified structures for single-cell patterning still need further study. In this paper, physically modified silicon nanostructures were introduced to study their effect on SHSY5Y cells. Double-beam double exposure laser interference lithography combined with metal-assisted etching (MACE) was used to fabricate the physically modified silicon nanostructures. It was found that the cells on the gratings stretched and grew orderly along the grating with a small cell area and almost the same cell length compared with those on the Si wafer (control group). While on the grids, the cells were round with limited spreading, grew independently and had the smallest cell area and cell length. Moreover, the localization ratio of cells adhered onto the areas of nanopillars in the grid structures with different periods has been investigated. The results suggest that the physically modified grid silicon nanostructures can regulate the single-cell localization growth and the rational design of substrate structures can maximize the single-cell localization ratio. The findings provide guidance for the design of physically modified nanostructures and regulating single cell patterning, and a better understanding of single-cell localized growth.

Graphical abstract: Single-cell patterning regulation by physically modified silicon nanostructures

Supplementary files

Article information

Article type
Paper
Submitted
18 Sun 2022
Accepted
23 Kul 2022
First published
23 Kul 2022

Anal. Methods, 2022,14, 1571-1578

Single-cell patterning regulation by physically modified silicon nanostructures

X. Wu, R. Liu, L. Li, F. Yang, D. Liu, L. Wang, W. Yu, J. Xu, Z. Weng, L. Dong and Z. Wang, Anal. Methods, 2022, 14, 1571 DOI: 10.1039/D2AY00092J

To request permission to reproduce material from this article, please go to the Copyright Clearance Center request page.

If you are an author contributing to an RSC publication, you do not need to request permission provided correct acknowledgement is given.

If you are the author of this article, you do not need to request permission to reproduce figures and diagrams provided correct acknowledgement is given. If you want to reproduce the whole article in a third-party publication (excluding your thesis/dissertation for which permission is not required) please go to the Copyright Clearance Center request page.

Read more about how to correctly acknowledge RSC content.

Social activity

Spotlight

Advertisements