Issue 9, 2021

Highly electroconductive and uniform WS2 film growth by sulfurization of W film using diethyl sulfide

Abstract

The reduction of intrinsic defects, including vacancies and grain boundaries, remains one of the greatest challenges to produce high-performance transition metal dichalcogenides (TMDCs) electronic systems. A deeper comprehension of the underlying reaction mechanisms is also needed. In this work, we present a new sulfurization process of tungsten (W) film using a sulfur (S)-containing organic precursor for the growth of WS2 films on SiO2/Si substrates. The W film was deposited with precise layer thickness control by atomic layer deposition and uniformly sulfurized using diethyl sulfide (DES) as S precursor. Comprehensive optical and chemical analyses revealed that by using DES as S precursor, the S atoms were uniformly supplied, and sulfurization occurred accurately and delicately. Moreover, the WS2 film synthesized using DES showed outstanding electrical conductivity (∼37 mS cm−1), which was almost 17 times higher than that of the WS2 film synthesized using S powder. Based on the results of optical, electrical, and chemical analyses, we proposed and validated a hypothesis to explain the sulfurization mechanism. The fabricated TMDC materials using the method presented in this work show great potential for industrial application due to their highly uniform surface and improved electrical conductivity.

Graphical abstract: Highly electroconductive and uniform WS2 film growth by sulfurization of W film using diethyl sulfide

Article information

Article type
Research Article
Submitted
30 Oca 2021
Accepted
15 Mar 2021
First published
24 Mar 2021

Mater. Chem. Front., 2021,5, 3692-3698

Highly electroconductive and uniform WS2 film growth by sulfurization of W film using diethyl sulfide

Y. Lee, J. W. Jung and J. S. Lee, Mater. Chem. Front., 2021, 5, 3692 DOI: 10.1039/D1QM00173F

To request permission to reproduce material from this article, please go to the Copyright Clearance Center request page.

If you are an author contributing to an RSC publication, you do not need to request permission provided correct acknowledgement is given.

If you are the author of this article, you do not need to request permission to reproduce figures and diagrams provided correct acknowledgement is given. If you want to reproduce the whole article in a third-party publication (excluding your thesis/dissertation for which permission is not required) please go to the Copyright Clearance Center request page.

Read more about how to correctly acknowledge RSC content.

Social activity

Spotlight

Advertisements