Volume 231, 2021

Preparation of hollow metal–organic frameworks via epitaxial protection and selective etching

Abstract

Hollow metal–organic frameworks (MOFs) with only a shell may be used for efficient catalysis. In this work, a general sequential synthesis was employed to successfully create Hf-based hollow MOFs, such as UiO-66, MOF-808, and PCN-223. Etchants including monocarboxylic acids and H2O are required to remove the interior of the MOFs to form hollow structures, while the different stability of the interior and surface of the MOFs partly resulting from surface epitaxy protection was responsible for the selective etching. With these insights, scale-up of hollow octahedral UiO-66 was realized. This work paves a way to rationally design hollow MOFs.

Graphical abstract: Preparation of hollow metal–organic frameworks via epitaxial protection and selective etching

Associated articles

Supplementary files

Article information

Article type
Paper
Submitted
09 ก.พ. 2564
Accepted
26 มี.ค. 2564
First published
02 ก.ค. 2564

Faraday Discuss., 2021,231, 181-193

Preparation of hollow metal–organic frameworks via epitaxial protection and selective etching

P. Chen, J. Chen, X. Hu and C. Wang, Faraday Discuss., 2021, 231, 181 DOI: 10.1039/D1FD00016K

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