Role of pO2 and film microstructure on the memristive properties of La2NiO4+δ/LaNiO3−δ bilayers

Klaasjan Maas; Chloé Wulles; Jose Manuel Caicedo Roque; Belén Ballesteros; Valentin Lafarge; José Santiso; Mónica Burriel

doi:10.1039/D1TA10296F

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Role of pO₂ and film microstructure on the memristive properties of La₂NiO_4+δ/LaNiO_3−δ bilayers†

Klaasjan Maas,^a Chloé Wulles,^ab Jose Manuel Caicedo Roque,^b Belén Ballesteros,

^b Valentin Lafarge,^ab José Santiso

*^b and Mónica Burriel

*^a

Author affiliations

* Corresponding authors

^a Univ. Grenoble Alpes, CNRS, Grenoble INP, LMGP, 38000 Grenoble, France
E-mail: monica.burriel@grenoble-inp.fr

^b Catalan Institute of Nanoscience and Nanotechnology (ICN2), CSIC and the Barcelona Institute of Science and Technology (BIST), Campus UAB, 08193 Bellaterra, Barcelona, Spain
E-mail: jose.santiso@icn2.cat

Abstract

LaNiO₃/La₂NiO₄ bilayers deposited at varying pO₂ conditions resulted in remarkable differences in film microstructure and cell parameters, directly affecting the electrical behaviour of Pt/LaNiO₃/La₂NiO₄/Pt devices. The devices deposited at low pO₂ showed the largest memristance. We propose this is due to the formation of a p-type Schottky contact between LaNiO₃ and La₂NiO₄, where the extent of its carrier depletion width can be modulated by the electric-field induced drift of interstitial oxygen ions acting as mobile acceptor dopants in La₂NiO₄.

This article is part of the themed collection: Special issue in honour of Prof. John Kilner’s 75th birthday

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Article information

DOI: https://doi.org/10.1039/D1TA10296F
Article type: Paper
Submitted: 01 Des 2021
Accepted: 29 Jan 2022
First published: 02 Feb 2022
This article is Open Access

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J. Mater. Chem. A, 2022,10, 6523-6530

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Role of pO₂ and film microstructure on the memristive properties of La₂NiO_4+δ/LaNiO_3−δ bilayers

K. Maas, C. Wulles, J. M. Caicedo Roque, B. Ballesteros, V. Lafarge, J. Santiso and M. Burriel, J. Mater. Chem. A, 2022, 10, 6523 DOI: 10.1039/D1TA10296F

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Journal of Materials Chemistry A