Machine learning-driven soft plasma etching for precision structuring of biofunctional organic semiconductor films

Abstract

This study pioneers a novel in situ strategy for depth-resolved analysis of organic thin films by integrating soft plasma etching with real-time spectroscopy. This method achieves molecular-level selectivity by combining Bayesian-optimized CNN-LSTM neural networks with spectral reconstruction algorithms, and we establish a closed-loop optimization framework that predicts etching parameters with sub-nanometer accuracy, thereby enhancing carrier mobility by 42% and reducing interface trap density to below 1011 cm2 eV. Depth-resolved spectroscopic profiling successfully reveals vertical composition gradients in blend films and quantifies spatial charge regulation mechanisms in transistors. This approach provides a universal platform for optimizing exciton distribution in organic photovoltaics, enhancing charge transport in flexible electronics, and advancing molecular-level design of high-performance organic semiconductor devices.

Graphical abstract: Machine learning-driven soft plasma etching for precision structuring of biofunctional organic semiconductor films

Supplementary files

Article information

Article type
Paper
Submitted
23 Jul 2025
Accepted
17 Sep 2025
First published
20 Oct 2025

J. Mater. Chem. C, 2025, Advance Article

Machine learning-driven soft plasma etching for precision structuring of biofunctional organic semiconductor films

W. Wang, M. Dai, X. Zou, Y. Zeng, Z. Zhao, D. Linfeng, Q. Xie, K. Yao, S. Zhang, Y. Quan, Y. Hu, M. Gou, Z. Gao, Z. Wang, X. Li, L. Qi, K. Shen, Y. Wang and Y. Zhang, J. Mater. Chem. C, 2025, Advance Article , DOI: 10.1039/D5TC02791H

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