Issue 9, 2024

Metrology for 2D materials: a perspective review from the international roadmap for devices and systems

Abstract

The International Roadmap for Devices and Systems (IRDS) predicts the integration of 2D materials into high-volume manufacturing as channel materials within the next decade, primarily in ultra-scaled and low-power devices. While their widespread adoption in advanced chip manufacturing is evolving, the need for diverse characterization methods is clear. This is necessary to assess structural, electrical, compositional, and mechanical properties to control and optimize 2D materials in mass-produced devices. Although the lab-to-fab transition remains nascent and a universal metrology solution is yet to emerge, rapid community progress underscores the potential for significant advancements. This paper reviews current measurement capabilities, identifies gaps in essential metrology for CMOS-compatible 2D materials, and explores fundamental measurement science limitations when applying these techniques in high-volume semiconductor manufacturing.

Graphical abstract: Metrology for 2D materials: a perspective review from the international roadmap for devices and systems

Article information

Article type
Review Article
Submitted
26 dec 2023
Accepted
30 mar 2024
First published
08 apr 2024
This article is Open Access
Creative Commons BY-NC license

Nanoscale Adv., 2024,6, 2260-2269

Metrology for 2D materials: a perspective review from the international roadmap for devices and systems

U. Celano, D. Schmidt, C. Beitia, G. Orji, A. V. Davydov and Y. Obeng, Nanoscale Adv., 2024, 6, 2260 DOI: 10.1039/D3NA01148H

This article is licensed under a Creative Commons Attribution-NonCommercial 3.0 Unported Licence. You can use material from this article in other publications, without requesting further permission from the RSC, provided that the correct acknowledgement is given and it is not used for commercial purposes.

To request permission to reproduce material from this article in a commercial publication, please go to the Copyright Clearance Center request page.

If you are an author contributing to an RSC publication, you do not need to request permission provided correct acknowledgement is given.

If you are the author of this article, you do not need to request permission to reproduce figures and diagrams provided correct acknowledgement is given. If you want to reproduce the whole article in a third-party commercial publication (excluding your thesis/dissertation for which permission is not required) please go to the Copyright Clearance Center request page.

Read more about how to correctly acknowledge RSC content.

Social activity

Spotlight

Advertisements