Issue 15, 2022

Continuous flow fabrication of green graphene oxide in aqueous hydrogen peroxide

Abstract

Highly processible graphene oxide (GO) has a diversity of applications as a material readily dispersed in aqueous media. However, methods for preparing such free-standing GO use hazardous and toxic reagents and generate significant waste streams. This is an impediment for uptake of GO in any application, for developing sustainable technologies and industries, and overcoming this remains a major challenge. We have developed a robust scalable continuous flow method for fabricating GO directly from graphite in 30% aqueous hydrogen peroxide which dramatically minimises the generation of waste. The process features the continuous flow thin film microfluidic vortex fluidic device (VFD), operating at specific conditions while irradiated sequentially by UV LED than a NIR pulsed laser. The resulting ‘green’ graphene oxide (gGO) has unique properties, possessing highly oxidized edges with large intact sp2 domains which gives rise to exceptional electrical and optical properties, including purple to deep blue emission of narrow full width at half maximum (<35 nm). Colloidally stable gGO exhibits cytotoxicity owing to the oxidised surface groups while solid-state films of gGO are biocompatible. The continuous flow method of generating gGO also provides unprecedented control of the level of oxidation and its location in the exfoliated graphene sheets by harnessing the high shear topological fluid flows in the liquid, and varying the wavelength, power and pulse frequency of the light source.

Graphical abstract: Continuous flow fabrication of green graphene oxide in aqueous hydrogen peroxide

Supplementary files

Article information

Article type
Communication
Submitted
15 Mot 2022
Accepted
18 Mot 2022
First published
19 Mot 2022
This article is Open Access
Creative Commons BY-NC license

Nanoscale Adv., 2022,4, 3121-3130

Continuous flow fabrication of green graphene oxide in aqueous hydrogen peroxide

K. Vimalanathan, J. Scott, X. Pan, X. Luo, S. Rahpeima, Q. Sun, J. Zou, N. Bansal, E. Prabawati, W. Zhang, N. Darwish, M. R. Andersson, Q. Li and C. L. Raston, Nanoscale Adv., 2022, 4, 3121 DOI: 10.1039/D2NA00310D

This article is licensed under a Creative Commons Attribution-NonCommercial 3.0 Unported Licence. You can use material from this article in other publications, without requesting further permission from the RSC, provided that the correct acknowledgement is given and it is not used for commercial purposes.

To request permission to reproduce material from this article in a commercial publication, please go to the Copyright Clearance Center request page.

If you are an author contributing to an RSC publication, you do not need to request permission provided correct acknowledgement is given.

If you are the author of this article, you do not need to request permission to reproduce figures and diagrams provided correct acknowledgement is given. If you want to reproduce the whole article in a third-party commercial publication (excluding your thesis/dissertation for which permission is not required) please go to the Copyright Clearance Center request page.

Read more about how to correctly acknowledge RSC content.

Social activity

Spotlight

Advertisements