Issue 24, 2023

Promoting photothermal antibacterial activity through an excited-state intramolecular proton transfer process

Abstract

The construction of an efficient photothermal antibacterial platform is a promising strategy for the treatment of drug-resistant bacterial infections. Herein, through the introduction of excited-state intramolecular proton transfer to promote the photothermal effect, N-(2,4-dihydroxybenzylidene)-4-aminophenol (DOA)–polyvinyl alcohol (PVA) systems (DPVA) can reach 55 °C within 10 s under irradiation. They show superior antibacterial behavior against drug-resistant bacteria and a therapeutic effect on infected skin wounds with only 100 s of irradiation, much faster than those of reported photothermal materials (5–10 min). This work provides a convenient approach to fabricate broad-spectrum antibacterial wound dressings for treating bacteria-infected wounds, greatly contributing to the design and applications of photothermal antibacterial platforms.

Graphical abstract: Promoting photothermal antibacterial activity through an excited-state intramolecular proton transfer process

Supplementary files

Article information

Article type
Paper
Submitted
07 des 2022
Accepted
08 feb 2023
First published
08 feb 2023

J. Mater. Chem. B, 2023,11, 5537-5543

Promoting photothermal antibacterial activity through an excited-state intramolecular proton transfer process

W. Yao, T. Deng, A. Huang, Y. Zhang, Q. Li and Z. Li, J. Mater. Chem. B, 2023, 11, 5537 DOI: 10.1039/D2TB02664C

To request permission to reproduce material from this article, please go to the Copyright Clearance Center request page.

If you are an author contributing to an RSC publication, you do not need to request permission provided correct acknowledgement is given.

If you are the author of this article, you do not need to request permission to reproduce figures and diagrams provided correct acknowledgement is given. If you want to reproduce the whole article in a third-party publication (excluding your thesis/dissertation for which permission is not required) please go to the Copyright Clearance Center request page.

Read more about how to correctly acknowledge RSC content.

Social activity

Spotlight

Advertisements