Issue 92, 2013
From the journal:

Chemical Communications

In situ atomic-scale visualization of oxide islanding during oxidation of Cu surfaces†

Guangwen Zhou,*a   Langli Luo,a   Liang Li,a   Jim Ciston,b   Eric A. Stach,c   Wissam A. Saidid  and  Judith C. Yangd  

* Corresponding authors

a Department of Mechanical Engineering, State University of New York at Binghamton, NY 13902, USA
E-mail: gzhou@binghamton.edu

b National Center for Electron Microscopy, Lawrence Berkeley National Laboratory, Berkeley, CA 94720, USA

c Center for Functional Nanomaterials, Brookhaven National Laboratory, Upton, NY 11973, USA

d Department of Chemical and Petroleum Engineering, University of Pittsburgh, Pittsburgh, PA 15261, USA

Abstract

Oxidation of Cu occurs via Cu2O islanding on an oxide wetting layer at a critical thickness of two atomic layers. The transition from 2D wetting-layer growth to 3D oxide islanding is driven energetically arising from the Cu–Cu2O interfacial interaction.

Graphical abstract: In situ atomic-scale visualization of oxide islanding during oxidation of Cu surfaces

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Article information

DOI
https://doi.org/10.1039/C3CC46684A
Article type
Communication
Submitted
01 စက် 2013
Accepted
02 အောက် 2013
First published
03 အောက် 2013

Chem. Commun., 2013,49, 10862-10864

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In situ atomic-scale visualization of oxide islanding during oxidation of Cu surfaces

G. Zhou, L. Luo, L. Li, J. Ciston, E. A. Stach, W. A. Saidi and J. C. Yang, Chem. Commun., 2013, 49, 10862 DOI: 10.1039/C3CC46684A

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