Issue 10, 2024

Antimicrobial coatings based on amine-terminated graphene oxide and Nafion with remarkable thermal resistance

Abstract

We present a novel type of layer-by-layer (LbL) waterborne coating based on Nafion and amine-terminated graphene oxide (GO–NH2) that inhibits the growth of Escherichia coli and Staphylococcus aureus by more than 99% and this performance is not compromised upon extensive thermal annealing at 200 °C. Quartz crystal microbalance (QCM) sensorgrams allow the real time monitoring of the build-up of the LbL assemblies, a process that relies on the strong electrostatic interactions between Nafion (pH = 2.7, ζ = −54.8 mV) and GO–NH2 (pH = 2, ζ = 26.7 mV). Atomic force microscopy (AFM), contact angle and zeta potential measurements were used to characterise the multilayer assemblies. We demonstrate here that Nafion/GO–NH2 advanced coatings can offer drug-free and long-lasting solutions to microbial colonization and can withstand dry heat sterilization, without any decline in their performance.

Graphical abstract: Antimicrobial coatings based on amine-terminated graphene oxide and Nafion with remarkable thermal resistance

Article information

Article type
Paper
Submitted
28 дек. 2023
Accepted
04 мар. 2024
First published
15 мар. 2024
This article is Open Access
Creative Commons BY-NC license

Nanoscale Adv., 2024,6, 2594-2601

Antimicrobial coatings based on amine-terminated graphene oxide and Nafion with remarkable thermal resistance

M. S. Beg, E. N. Gibbons, S. Gavalas, M. A. Holden, M. Krysmann and A. Kelarakis, Nanoscale Adv., 2024, 6, 2594 DOI: 10.1039/D3NA01154B

This article is licensed under a Creative Commons Attribution-NonCommercial 3.0 Unported Licence. You can use material from this article in other publications, without requesting further permission from the RSC, provided that the correct acknowledgement is given and it is not used for commercial purposes.

To request permission to reproduce material from this article in a commercial publication, please go to the Copyright Clearance Center request page.

If you are an author contributing to an RSC publication, you do not need to request permission provided correct acknowledgement is given.

If you are the author of this article, you do not need to request permission to reproduce figures and diagrams provided correct acknowledgement is given. If you want to reproduce the whole article in a third-party commercial publication (excluding your thesis/dissertation for which permission is not required) please go to the Copyright Clearance Center request page.

Read more about how to correctly acknowledge RSC content.

Social activity

Spotlight

Advertisements