Issue 39, 2022

Machine learning enhanced in situ electron beam lithography of photonic nanostructures

Abstract

We report on the deterministic fabrication of quantum devices aided by machine-learning-based image processing. The goal of the work is to demonstrate that pattern recognition based on specifically trained machine learning (ML) algorithms and applying it to luminescence maps can strongly enhance the capabilities of modern fabrication technologies that rely on a precise determination of the positions of quantum emitters like, for instance, in situ lithography techniques. In the present case, we apply in situ electron beam lithography (EBL) to deterministically integrate single InGaAs quantum dots (QDs) into circular Bragg grating resonators with increased photon extraction efficiency (PEE). In this nanotechnology platform, suitable QDs are selected by 2D cathodoluminescence maps before EBL of the nanoresonators aligned to the selected emitters is performed. Varying the electron beam dose of cathodoluminescence (CL) mapping, we intentionally change the signal-to-noise ratio of the CL maps to mimic different brightness of the emitters and to train the ML algorithm. ML-based image processing is then used to denoise the images for reliable and accurate QD position retrieval. This way, we achieve a significant enhancement in the PEE and position accuracy, leading to more than one order increase of sensitivity in ML-enhanced in situ EBL. Overall, this demonstrates the high potential of ML-based image processing in deterministic nanofabrication which can be very attractive for the fabrication of bright quantum light sources based on emitters with low luminescence yield in the future.

Graphical abstract: Machine learning enhanced in situ electron beam lithography of photonic nanostructures

Article information

Article type
Paper
Submitted
06 Jūl. 2022
Accepted
20 Sept. 2022
First published
20 Sept. 2022
This article is Open Access
Creative Commons BY license

Nanoscale, 2022,14, 14529-14536

Machine learning enhanced in situ electron beam lithography of photonic nanostructures

J. Donges, M. Schlischka, C. Shih, M. Pengerla, I. Limame, J. Schall, L. Bremer, S. Rodt and S. Reitzenstein, Nanoscale, 2022, 14, 14529 DOI: 10.1039/D2NR03696G

This article is licensed under a Creative Commons Attribution 3.0 Unported Licence. You can use material from this article in other publications without requesting further permissions from the RSC, provided that the correct acknowledgement is given.

Read more about how to correctly acknowledge RSC content.

Social activity

Spotlight

Advertisements