Issue 77, 2022

Atmospheric pressure atomic layer deposition to increase organic solvent resistance of PDMS

Abstract

We explore three variants of atomic layer deposition (ALD) to deposit titanium oxide on the soft polymer polydimethylsiloxane (PDMS). We show that the organic solvent resistance of PDMS is increased by two orders of magnitude compared to uncoated PDMS for ALD performed at atmospheric pressure, which results in a unique surface–subsurface coating of PDMS.

Graphical abstract: Atmospheric pressure atomic layer deposition to increase organic solvent resistance of PDMS

Supplementary files

Article information

Article type
Communication
Submitted
28 Apr. 2022
Accepted
05 Aug. 2022
First published
11 Aug. 2022
This article is Open Access
Creative Commons BY-NC license

Chem. Commun., 2022,58, 10805-10808

Atmospheric pressure atomic layer deposition to increase organic solvent resistance of PDMS

A. Santoso, A. Damen, J. R. van Ommen and V. van Steijn, Chem. Commun., 2022, 58, 10805 DOI: 10.1039/D2CC02402K

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