Issue 7, 2019

Monolayer black phosphorus by sequential wet-chemical surface oxidation

Abstract

We report a straightforward chemical methodology for controlling the thickness of black phosphorus flakes down to the monolayer limit by layer-by-layer oxidation and thinning, using water as solubilizing agent. Moreover, the oxidation process can be stopped at will by two different passivation procedures, namely the non-covalent functionalization with perylene diimide chromophores, which prevents the photooxidation, or by using a protective ionic liquid layer. The obtained flakes preserve their electronic properties as demonstrated by fabricating a BP field-effect transistor (FET). This work paves the way for the preparation of BP devices with controlled thickness.

Graphical abstract: Monolayer black phosphorus by sequential wet-chemical surface oxidation

Supplementary files

Article information

Article type
Paper
Submitted
01 Nov. 2018
Accepted
17 Janv. 2019
First published
25 Janv. 2019
This article is Open Access
Creative Commons BY-NC license

RSC Adv., 2019,9, 3570-3576

Monolayer black phosphorus by sequential wet-chemical surface oxidation

S. Wild, V. Lloret, V. Vega-Mayoral, D. Vella, E. Nuin, M. Siebert, M. Koleśnik-Gray, M. Löffler, K. J. J. Mayrhofer, C. Gadermaier, V. Krstić, F. Hauke, G. Abellán and A. Hirsch, RSC Adv., 2019, 9, 3570 DOI: 10.1039/C8RA09069F

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