Issue 44, 2018

Designing effective Si/Ag interface via controlled chemical etching for photoelectrochemical CO2 reduction

Abstract

Photoelectrochemical reduction of CO2 to value-added chemicals represents a promising approach for artificial photosynthesis, but often suffers from limited selectivity and stability. Improving its performance would require proper design of semiconductor and co-catalyst materials, along with a strategy for effective coupling. Here, we report that controlled chemical etching of Si wafer by Ag+ ions yields effective semiconductor/co-catalyst interface for photoelectrochemical CO2 reduction. Resultant photocathodes exhibit large photocurrent density (∼10 mA cm−2 under 0.5 sun), great CO faradaic efficiency (90% at −0.5 V versus reversible hydrogen electrode), and impressive operational stability (little activity or selectivity loss within 8 h). Further enhancement (by ∼20%) of photocurrent density is achieved by combining photolithography patterning with chemical etching. Our study applies long-known chemistry as an unexpected solution and may provide a new strategy for high-performance photoelectrochemical CO2 reduction.

Graphical abstract: Designing effective Si/Ag interface via controlled chemical etching for photoelectrochemical CO2 reduction

Supplementary files

Article information

Article type
Communication
Submitted
07 Jūn. 2018
Accepted
18 Jūl. 2018
First published
20 Jūl. 2018

J. Mater. Chem. A, 2018,6, 21906-21912

Designing effective Si/Ag interface via controlled chemical etching for photoelectrochemical CO2 reduction

Y. Hu, F. Chen, P. Ding, H. Yang, J. Chen, C. Zha and Y. Li, J. Mater. Chem. A, 2018, 6, 21906 DOI: 10.1039/C8TA05420G

To request permission to reproduce material from this article, please go to the Copyright Clearance Center request page.

If you are an author contributing to an RSC publication, you do not need to request permission provided correct acknowledgement is given.

If you are the author of this article, you do not need to request permission to reproduce figures and diagrams provided correct acknowledgement is given. If you want to reproduce the whole article in a third-party publication (excluding your thesis/dissertation for which permission is not required) please go to the Copyright Clearance Center request page.

Read more about how to correctly acknowledge RSC content.

Social activity

Spotlight

Advertisements