Issue 12, 2016

Chemical vapour deposition of rhenium disulfide and rhenium-doped molybdenum disulfide thin films using single-source precursors

Abstract

Polycrystalline thin films of rhenium disulfide (ReS2) and the alloys Mo1−xRexS2 (0 ≤ x ≤ 0.06) have been deposited by aerosol-assisted chemical vapour deposition (AA-CVD) using [Re(μ-SiPr)3(SiPr)6] (1) and [Mo(S2CNEt2)4] (2) in different molar ratios at 475 °C. The deposited films were characterised by p-XRD, SEM, and ICP-OE, Raman, and EDX spectroscopies. The p-XRD patterns of the films deposited from (1) correspond to ReS2 (x = 1) and those deposited from (2) matched to MoS2 (x = 0). Re-doping of up to 6% was achieved in MoS2 thin films by using different concentrations of precursor (1), the morphology of the doped films changed from lamellar for pure MoS2 to clusters at 6 mol% alloying with rhenium. The films are promising candidates as models for the incorporation of technetium into transition metal dichalcogenides as a means of immobilisation in nuclear waste processing. Exfoliation of these films is also a potential route towards modification of the optoelectronic properties of 2D molybdenite.

Graphical abstract: Chemical vapour deposition of rhenium disulfide and rhenium-doped molybdenum disulfide thin films using single-source precursors

Supplementary files

Article information

Article type
Paper
Submitted
01 Febr. 2016
Accepted
25 Febr. 2016
First published
25 Febr. 2016
This article is Open Access
Creative Commons BY license

J. Mater. Chem. C, 2016,4, 2312-2318

Author version available

Chemical vapour deposition of rhenium disulfide and rhenium-doped molybdenum disulfide thin films using single-source precursors

N. Al-Dulaimi, D. J. Lewis, X. L. Zhong, M. Azad Malik and P. O'Brien, J. Mater. Chem. C, 2016, 4, 2312 DOI: 10.1039/C6TC00489J

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