Issue 39, 2013
From the journal:

Chemical Communications

Orthogonal self-assembly and selective solvent vapour annealing: simplified processing of a photovoltaic blend†‡

Giovanna De Luca,ab   Andrea Liscio,c   Glauco Battagliarin,d   Long Chen,d   Luigi Monsù Scolaro,e   Klaus Müllen,d   Paolo Samorì*f  and  Vincenzo Palermo*c  

* Corresponding authors

a Dipartimento di Scienze del Farmaco e Prodotti per la Salute, Università di Messina, V.le Annunziata, 98168 Messina, Italy

b Istituto per i Materiali Compositi e Biomedici, Consiglio Nazionale delle Ricerche, P.le Tecchio 80, 80125 Napoli, Italy

c Istituto per la Sintesi Organica e la Fotoreattività, Consiglio Nazionale delle Ricerche, via Gobetti 101, 40129 Bologna, Italy
E-mail: vincenzo.palermo@isof.cnr.it

d Max Planck Institute for Polymer Research, Ackermannweg 10, 55128 Mainz, Germany

e Dipartimento di Scienze Chimiche, and C.I.R.C.M.S.B., Università di Messina, V.le Stagno d'Alcontres 31, 98166 Vill. S. Agata, Messina, Italy

f ISIS & icFRC, Université de Strasbourg & CNRS, 8 allée Gaspard Monge, 67000 Strasbourg, France
E-mail: samori@unistra.fr

Abstract

Selective solvent vapour annealing is used on a photovoltaic blend to enhance the interaction between the electron acceptor and the electron donor, simplifying thin films post-processing for photovoltaic applications. A remarkable improvement in the interfacial charge transfer in the bulk hetero-junction is attained, as measured by Kelvin Probe Force Microscopy.

Graphical abstract: Orthogonal self-assembly and selective solvent vapour annealing: simplified processing of a photovoltaic blend

About
Cited by
Related
Download options Please wait...

Supplementary files

Article information

DOI
https://doi.org/10.1039/C2CC37909K
Article type
Communication
Submitted
31 Okt. 2012
Accepted
27 Dec. 2012
First published
03 Janv. 2013

Chem. Commun., 2013,49, 4322-4324

Permissions

Request permissions

Orthogonal self-assembly and selective solvent vapour annealing: simplified processing of a photovoltaic blend

G. De Luca, A. Liscio, G. Battagliarin, L. Chen, L. M. Scolaro, K. Müllen, P. Samorì and V. Palermo, Chem. Commun., 2013, 49, 4322 DOI: 10.1039/C2CC37909K

To request permission to reproduce material from this article, please go to the Copyright Clearance Center request page.

If you are an author contributing to an RSC publication, you do not need to request permission provided correct acknowledgement is given.

If you are the author of this article, you do not need to request permission to reproduce figures and diagrams provided correct acknowledgement is given. If you want to reproduce the whole article in a third-party publication (excluding your thesis/dissertation for which permission is not required) please go to the Copyright Clearance Center request page.

Read more about how to correctly acknowledge RSC content.

Social activity

Spotlight

Advertisements