Issue 8, 2016

Atomic layer stack deposition-annealing synthesis of CuWO4

Abstract

A stack deposition-annealing (SDA) approach was demonstrated for the synthesis of CuWO4via atomic layer deposition (ALD). The resulted CuWO4 showed promising activity as a photoanode for photoelectrochemical (PEC) water splitting. This methodology can, in principal, be utilized for the ALD of many ternary and quaternary oxides for various applications.

Graphical abstract: Atomic layer stack deposition-annealing synthesis of CuWO4

Supplementary files

Article information

Article type
Communication
Submitted
31 Aug 2015
Accepted
19 Okt 2015
First published
19 Okt 2015

J. Mater. Chem. A, 2016,4, 2826-2830

Atomic layer stack deposition-annealing synthesis of CuWO4

Y. Gao, O. Zandi and T. W. Hamann, J. Mater. Chem. A, 2016, 4, 2826 DOI: 10.1039/C5TA06899A

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