Molecular precursor-directed growth of nanostructured SnS2 for memristive and neuromorphic electronics

Abstract

Low-dimensional layered metal chalcogenides have recently garnered significant attention for advanced electronic and optoelectronic applications, particularly memristive and synaptic devices; however, achieving purity and scalable fabrication remains a key challenge. We demonstrate a facile and scalable in situ solvothermal approach enabling low-temperature deposition of SnS2 thin films, employing the single-source precursor (SSP) [Cl2Sn(S2P(OiC3H7)2)2]. The distorted octahedral complex [Cl2Sn(S2P(OiC3H7)2)2], derived from SnCl4, serves as an efficient SSP for solvothermal growth of SnS2 on ITO. The films exhibit phase-pure hexagonal crystallinity with well-defined composition and morphology, and an optical bandgap of 2.06 eV. Leveraging this synthesis route, Ag/SnS2/ITO memristive device was fabricated, exhibiting electroforming-free bipolar resistive switching at ±0.6 V. The device demonstrated stable endurance over more than 102 cycles with an ON/OFF ratio of ∼10. Additionally, the device further exhibits analogue conductance modulation and synaptic plasticity, enabling emulation of biological learning behaviour when implemented in a hardware-aware artificial neural network. The experimentally derived weight update dynamics achieved 92% classification accuracy on the MNIST dataset. Collectively, these findings establish SSP-derived SnS2 thin films as a viable material platform for emerging memory and neuromorphic electronics.

Graphical abstract: Molecular precursor-directed growth of nanostructured SnS2 for memristive and neuromorphic electronics

Supplementary files

Article information

Article type
Paper
Submitted
25 Feb 2026
Accepted
18 May 2026
First published
18 May 2026
This article is Open Access
Creative Commons BY license

J. Mater. Chem. C, 2026, Advance Article

Molecular precursor-directed growth of nanostructured SnS2 for memristive and neuromorphic electronics

S. S. Dixit, T. R. Desai, O. Kapur, B. Ding, R. Huang and C. Gurnani, J. Mater. Chem. C, 2026, Advance Article , DOI: 10.1039/D6TC00598E

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