Issue 11, 2023

Reducing defect density in UiO-68–CHO is key for its efficient and reliable post-synthetic modification

Abstract

Post-synthetic modification (PSM) is a powerful tool for introducing complex functionalities into metal–organic frameworks (MOFs). Aldehyde-tagged MOFs are particularly appealing platforms for covalent PSM due to the high reactivity of aldehyde groups, but the same feature also makes their solvothermal synthesis challenging. In this work, we show that while lowering the temperature during the synthesis of aldehyde-tagged UiO-68 avoids aldehyde group degradation and yields a highly porous and crystalline material, the resulting UiO-68–CHO contains a large fraction of missing linker defects and, as a result, its PSM is both inefficient and non-repeatable. However, we also show that this problem could be solved by 1) using an excess of linker during the synthesis of the MOF and 2) by soaking the crude material in the solution of the linker, which together reduce the density of defects enough to yield an excellent substrate for PSM. Treatment of the ‘healed’ material with model amines gives nearly quantitative conversions of aldehydes into imines, even if no excess of reagents is used. Importantly, the PSM of the ‘healed’ UiO-68–CHO gives repeatable results over many days, unlike the PSM of the highly defective MOF. Owing to these developments, various functionalities, such as new coordination sites, drug cargo, chirality, and hydrophobicity, were successfully introduced into the UiO-68 framework. The deleterious influence of defects on the PSM of MOFs and the solution to this problem proposed herein are likely to be of general nature and hence might help in developing new and versatile platforms for covalent PSMs.

Graphical abstract: Reducing defect density in UiO-68–CHO is key for its efficient and reliable post-synthetic modification

Supplementary files

Article information

Article type
Paper
Submitted
28 4 2023
Accepted
06 7 2023
First published
06 7 2023

Mol. Syst. Des. Eng., 2023,8, 1381-1387

Reducing defect density in UiO-68–CHO is key for its efficient and reliable post-synthetic modification

M. Wiszniewski and M. J. Chmielewski, Mol. Syst. Des. Eng., 2023, 8, 1381 DOI: 10.1039/D3ME00071K

To request permission to reproduce material from this article, please go to the Copyright Clearance Center request page.

If you are an author contributing to an RSC publication, you do not need to request permission provided correct acknowledgement is given.

If you are the author of this article, you do not need to request permission to reproduce figures and diagrams provided correct acknowledgement is given. If you want to reproduce the whole article in a third-party publication (excluding your thesis/dissertation for which permission is not required) please go to the Copyright Clearance Center request page.

Read more about how to correctly acknowledge RSC content.

Social activity

Spotlight

Advertisements