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2024, Vol 15, Issue 45
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Front cover
Polym. Chem., 2024,15, 4593-4594

DOI: 10.1039/D4PY90140A, Cover
Contents list
Polym. Chem., 2024,15, 4595-4598

DOI: 10.1039/D4PY90141J, Front/Back Matter
Emerging trends in the chemistry of polymeric resists for extreme ultraviolet lithography
Jie Cen, Zhengyu Deng and Shiyong Liu
Polym. Chem., 2024,15, 4599-4614
DOI: 10.1039/D4PY00957F, Review Article
From themed collection Polymer Chemistry 15th Anniversary Collection
Solvent quality shape control in continuous flow block copolymer self-assembly
Axel-Laurenz Buckinx, Lakshani J. Weerarathna, Anna Sokolova and Tanja Junkers
Polym. Chem., 2024,15, 4615-4621
DOI: 10.1039/D4PY01174K, Communication
From themed collection Polymer Chemistry 15th Anniversary Collection
Reversible aminolysis: a new concept for postpolymerization modification
Koki Kasai, Hideki Amii and Ryohei Kakuchi
Polym. Chem., 2024,15, 4622-4626
DOI: 10.1039/D4PY00827H, Communication
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