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Cobalt(III) acetylacetonate (Co(acac)3) was used as a precursor to grow pure Co3O4 with pulsed-spray evaporation chemical vapor deposition (PSE-CVD). The effect of solvent and substrate temperature on the growth kinetics and morphology of the films was investigated. The obtained spinel exhibited good catalytic performance.

Graphical abstract: Controlled synthesis of Co3O4 spinel with Co(acac)3 as precursor

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