Open Access Article
Qihao
Shen
ab,
Jinyu
Gu
a,
Lei
Wang
a,
Chao
Wang
a,
Qingfeng
Song
*a,
Xugui
Xia
a,
Jincheng
Liao
a,
Lidong
Chen
ab and
Shengqiang
Bai
*ab
aState Key Laboratory of High Performance Ceramics and Superfine Microstructure, Shanghai Institute of Ceramics, Chinese Academy of Sciences, Shanghai 200050, China. E-mail: qfsong@mail.sic.ac.cn; bsq@mail.sic.ac.cn
bCenter of Materials Science and Optoelectronics Engineering, University of Chinese Academy of Sciences, Beijing 100049, China
First published on 3rd October 2025
NbFeSb-based half-Heuslers (HHs) exhibit exceptional high-temperature thermoelectric (TE) performance, but their practical deployment is hindered by insufficient oxidation resistance. Here, a surface aluminization technology is introduced to improve oxidation resistance by forming in situ intermetallic compounds on the material surface. During this process, a dense coating with a thickness of 20–60 μm is formed through a solid/gas reaction between Al and the main constituents of HHs, exhibiting a lamellar structure composed of Al13Fe4, Al3(Nb,Hf) and AlSb in sequence. The coating and substrate exhibit a robust metallurgical bond. Benefiting from the intrinsic oxidation resistance of aluminides, the coating serves as an effective diffusion barrier against oxygen penetration. Diffusion kinetics analysis reveals that the coating/substrate interface maintains an ultra-low diffusion rate in air, extending the predicted service life to over 10 years. The coated elements demonstrate negligible degradation in TE properties during prolonged aging at 973 K. The surface aluminization method effectively improves the feasibility and thermal stability of NbFeSb-based HHs in air, thus advancing their practical applications.
As the determinant of theoretical conversion efficiency of TE devices, the dimensionless figure of merit (zT) of TE materials became the research focus in the past few decades, and many novel TE materials have been discovered.10–20 Among them, HH compounds are considered as the ideal candidates for high-temperature power generators due to their excellent TE and mechanical properties.14,15,21–26 With a deeper understanding of thermal and electrical transport mechanisms, the TE performance of HHs has been greatly improved. Recently, the zT of p-type NbFeSb and n-type ZrNiSn based HHs reached 1.60 and 1.12,14,15 respectively. The energy conversion efficiency of single and segmented HH devices has crossed 11.1% and 13.3%, respectively.27
In practical services, the thermal stability of TE materials and devices is more critical than their zT and efficiency.28–30 Most TE materials,31–38 including Mg2Si, CoSb3, HH, etc., exhibit poor oxidation resistance, especially at high temperatures and in an air environment. The formation of electrically insulating oxides results in the change of chemical composition, thereby causing deterioration of zT.39 For example, in CoSb3-based skutterudite, the formation of Sb2O3 significantly degrades electrical conductivity, which causes a 29.2% deterioration in zT.32 Easily oxidized p-type (Zr,Hf,Ti)Co(Sb,Sn) exhibits a 49.5% decrease of output power in a TE generator after working in air for 115 hours at a temperature gradient of 823 K/294 K.35 Similarly, the output power of an n-type (Zr,Hf)Ni(Sb,Sn) TE device drops to 61% of the initial value after operation at 778 K/300 K for 15 days in air.34
To make the applications of HHs feasible in air, the oxidation resistance should be considered as an essential evaluation criterion. The strong composition–property coupling inherent in TE materials presents a critical challenge in developing oxidation-resistant materials. Some efforts have been made to develop protective coatings for TE materials. For example, 8 mol% yttria-stabilized zirconia (YSZ), yttria (Y2O3) and alumina (Al2O3) coatings are designed for Mg2Si.40 Nevertheless, conventional plasma spraying techniques struggle to prevent process-induced thermal damage of TE materials. Aerogel coatings have been used to protect CoSb3-based skutterudites. However, the interconnected micro and mesopores in aerogels provide oxygen migration channels, which cause progressive degradation during long-term operation.39 The designed CrSi coating for (Zr,Ti)Ni(Sn,Sb) and (Zr,Ti)Co(Sn,Sb) prepared by magnetron sputtering can prevent the diffusion of oxygen, but the limits of coating thickness (<2 μm) severely affect its service life.41 By controlled oxidation treatments, in situ dense oxide layers can be formed on the surface of n-type (Zr,Hf)Ni(SnSb) and p-type (Zr,Hf)Co(Sb,Sn).34,36 However, the formation of such dense oxide coatings is governed by chemical composition, thereby restricting the applicability of this strategy to specific material systems.
As high-temperature TE materials, Nb0.86Hf0.14FeSb-based half-Heusler (NHFS) alloys inevitably undergo oxidative degradation during service in oxygen-containing environments. Conventional spray or deposition coatings often suffer from interfacial compatibility issues. The pack cementation method, as an in situ diffusion coating technique, utilizes intrinsic elements from NHFS to form a lamellar aluminide coating on the surface. Benefiting from interlayer interdiffusion and matched coefficients of thermal expansion, a robust metallurgical bond forms at the coating/substrate interface. This aluminide coating effectively blocks inward oxygen diffusion, preventing oxidation-induced cracking. Although interfacial diffusion occurs at elevated temperatures, the thickening rate of the diffusion layer is significantly suppressed due to attenuation of the aluminum concentration gradient. Furthermore, coated NHFS elements exhibit negligible degradation in TE performance after aging at 973 K, demonstrating exceptional service stability of surface-aluminized NHFS in air.
The surface secondary electron image of coated NHFS is presented in SI Fig. A1. The rough surface is a characteristic metallurgical phenomenon inherent to pack cementation processes, which originates from non-uniform [Al] concentration gradients. The cross-sectional micro-XRD and surface XRD patterns of the aluminide layer are shown in Fig. 1(b) to determine the phase composition. The diffraction peaks of three aluminide phases in the coating are observed in surface XRD, namely, Al3(Nb,Hf), AlSb, and Al13Fe4. The absence of the NHFS peak indicates that the coating is thick enough beyond the detection depth of surficial XRD. The phase composition of the coating is also supported by cross-sectional micro-XRD. Due to the relatively large detection range of micro-XRD, the host phase NHFS is detected. This demonstrates compositional homogeneity throughout the coating. The overall reaction at the coating interface is:
| Al + (Nb,Hf)FeSb → Al3(Nb,Hf) + AlSb + Al13Fe4 |
The cross-sectional secondary electron image of the coated NHFS is shown in Fig. 1(c). The coating exhibits no cracks or pores and maintains strong interfacial bonding with the substrate. The secondary electron image and elemental line profiling of the amplified view of the selected area in Fig. 1(c) are shown in Fig. 1(d) and (e). Combined with elemental mapping results (SI Fig. A2), Al is uniformly distributed throughout the coating, while Nb, Fe, and Sb are distributed as a hierarchical structure. The Al content is maintained at approximately 72%. The observed decline in Al content is attributable to the lower Al concentration in AlSb than that in both Al3(Nb,Hf) and Al13Fe4. The observed layered architecture demonstrates sequential formation of three aluminide phases within localized regions. The reaction enthalpy (ΔH) values of the compounds directly correlate with their formation tendency, where lower ΔH indicates higher thermodynamic stability. As shown in SI Fig. A3, the progressively decreasing ΔH values of Al3Nb, AlSb and Al13Fe4 (−0.66, −0.51, and −0.43 eV/Al) align with their distribution in the layered structure. These findings align with the formation mechanism of alternate layered oxides.36 Thus, the distinct reaction enthalpies drive sequential precipitation of these phases in constrained diffusion zones.
Due to the interdiffusion of Al, a robust metallurgical bond forms at the coating/substrate interface, possessing a coefficient of thermal expansion (CTE) closely aligned with that of NHFS (Al3Nb ∼9.6 × 10−6 K−1, Al13Fe4 ∼ 11.9 × 10−6 K−1, and NHFS ∼10 × 10−6 K−1),45,46 effectively mitigating CTE mismatch between the coating and substrate. In addition, each aluminide layer maintains a thickness of merely 1–2 μm, effectively suppressing thermal stress within the coating. The interlayer diffusion significantly enhances the bonding strength, thereby preventing any observable cracking at elevated temperatures. In addition, the thickness of the coating can be precisely controlled to meet specific application requirements. The thickness shows a parabolic growth with holding time (see SI Fig. A4), indicating that the coating process is dominated by the diffusion process of Al.44 When the thickness is too thin, the substrate may become exposed, leading to insufficient protective performance. Conversely, an excessively thick coating can result in cracking at the edges and corners (see SI Fig. A5). Considering the protective effect, the optimal thickness of the coating is in the range of 20–60 μm.
Fig. 2(c) shows the appearance of uncoated and coated NHFS after aging at 973 K. The uncoated sample exhibits severe cracking and oxidation after 10 h, resulting in complete material failure. The cracks first appeared at the corners, which are the stress concentration zones. Under prolonged aging exposure, the progressive inward propagation of cracks ultimately induces the complete failure of NHFS. The catastrophic oxidation renders NHFS completely unsuitable for any application in oxygen-containing atmospheres. With the coating applied, the sample exhibits no visible degradation after aging at 973 K for 720 h. This remarkable improvement originates from the formation of thermally stable Al2O3, as confirmed by XRD analysis and EDS results (Fig. 2(d) and SI Fig. A7).
The XRD patterns of uncoated and coated NHFS after aging at 873 K and 973 K are shown in Fig. 2(d). For coated NHFS, four phases—Al2O3, Al3Nb, AlSb and Al5Fe2—are observed. Compared to the sample before aging, Al13Fe4 transforms into Al5Fe2, while Al3Nb and AlSb phases remain within the coating matrix. SI Table A1 shows the calculated enthalpies of formation of the possible reaction for the oxidation process of the aluminide coating. All three aluminum compounds can generate Al2O3 and corresponding oxides upon reaction with O2. This endows the coating with both oxidation resistance and self-healing capability. Fig. 2(d) also presents the XRD patterns of the uncoated NHFS after aging for 5 hours at 873 K and 973 K. The diffraction peaks of eight phases are observed, namely NbFeSb, Fe2O3, Nb2O5, NbO2, HfO2, FeNb2O6, FeSb and NbSb2. The CTEs for the main oxidation products are shown in SI Table A2. Due to the large difference in CTE between NHFS (9.0 × 10−6 K−1) and Fe2O3 (∼12.0 × 10−6 K−1), Nb2O5 (∼5.9 × 10−6 K−1), HfO2 (∼5.8 × 10−6 K−1),47–49 and the relatively high Pilling-Bedworth ratio of Nb/Nb2O5 (2.67) and Fe/Fe2O3 (2.09),50 substantial intrinsic compressive stresses are generated within the oxides and then evolved into cracks.
The cross-sectional BSE image of the uncoated NHFS after aging at 873 K for 20 h and the corresponding elemental line-scan profiles along the white arrows are shown in Fig. 3(a) and (b). From the BSE image observation, a two-layer structure is formed on the surface of the material. The elemental line-scan results indicate that the outer layer is composed of Fe, Nb and Hf oxides. The oxide layer exhibits a porous structure with visible cracks. The inner layer is composed of FeSb and NbSb2 mixtures. Unfortunately, these oxide layer structures fail to inhibit further oxidation. The total thickness of these two oxidation layers has been over 200 μm, which was caused by the accelerated oxidation rate in the porous structures.
Fig. 3(c) shows a representative backscattered electron (BSE) image and corresponding elemental mapping result of the coated NHFS after aging at 873 K for 720 h in air, revealing characteristic structure evolution. Compared to uncoated NHFS, the coated NHFS maintains structural integrity throughout the aging process. The Al2O3 surface layer serves as an effective barrier against inward diffusion of O2. Notably, a significant diffusion occurs at the interface. Al gradually diffuses into NHFS, forming a ∼15 μm diffusion layer (DL). This further strengthens the bonding between the aluminide coating and NHFS. Al content distribution in the coating layer of coated NHFS, from the coating to the substrate, before and after long-term aging at 873 K and 973 K is shown in Fig. 3(d). After aging at 873 K and 973 K for 720 h, the Al content decreases by 3.83% and 6.02% compared to the coated NHFS before aging, respectively. This is primarily attributed to diffusion into the substrate and the self-healing of the protective layer.
The BSE image of the diffusion layer and the corresponding elemental line-scan profiles along the white arrows are shown in Fig. 4(a) and (b). It indicates that the diffusion layer consists of Al3Fe, Al3Nb and NbSb2. The thickness of the diffusion layer increases progressively with both elevated aging temperature and prolonged exposure time. This may adversely affect the performance of NHFS.
The cross-sectional morphology of the coated NHFS exhibits negligible microstructural degradation following prolonged aging at temperatures below 973 K. The reaction-diffusion kinetics model is introduced to describe the kinetics of the diffusion layer (see SI Note A1).51 The thickness of DL at different aging temperatures is determined from the cross-sectional SEM images (see SI Fig. A9) and shown in Fig. 4(c). The thickness of the diffusion layer follows a parabolic relationship with time. This is attributed to the depletion of additional aluminum sources and the decline in the aluminum concentration gradient, which significantly suppresses the growth rate of the diffusion layer.
The parameters, including the chemical reaction constant k0, diffusion constant k1, activation energy of chemical reaction E0, and activation energy of diffusion E1, are calculated from the time-dependent thickness of the diffusion layer from 873 K to 973 K and are shown in SI Table A3. The obtained E0 and E1 are 230.00 kJ mol−1 and 91.09 kJ mol−1, respectively, suggesting that the formation of DL is a process controlled by diffusion. Based on the kinetic data, the relationship between the predicted thickness of DL and time is shown in Fig. 4(d). After aging at 873 K, 923 K, and 973 K for 10 years, the predicted DL thicknesses are only 48.32 μm, 57.53 μm and 67.02 μm, respectively, which are within the acceptable range for the practical TE devices.
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