Open Access Article
Filip Matějka
*ab,
Pavel Galář
a,
Josef Khunb,
Milan Dopitac,
Alena Michalcová
b,
Tomáš Popelář
a,
Jan Benedikt
d and
Kateřina Kůsová
a
aInstitute of Physics of the CAS, v.v.i., Cukrovarnická 10, 162 00 Prague 6, Czechia. E-mail: matejkaf@fzu.cz
bFaculty of Chemical Engineering, University of Chemistry and Technology, Technická 5, 166 28 Praha 6, Czechia
cFaculty of Mathematics and Physics, Charles University, Ke Karlovu 3, 121 16 Praha 2, Czechia
dInstitute of Experimental and Applied Physics, Kiel University, Leibnizstraße 19, 24118 Kiel, Germany
First published on 3rd November 2025
Silicon quantum dots (SiQDs) are a promising class of functional nanomaterials combining non-toxicity, in comparison with their binary counterparts, and tunable optoelectronic properties. However, reaching their full potential in applications requires scalable fabrication and fast and simpler modification methods, enabling bonding of a broad variety of ligands and control over the photoluminescence efficiency. Here, we advance a versatile synthesis–modification methodology based on non-thermal plasma. In particular, we complement synthesis in non-thermal plasma allowing for extensive size tuning of SiQDs with unconventional air-free plasma-induced in-liquid reactions (PILRs) which enable rapid attachment of diverse ligands, using 3D-printed components for atmospheric control. Our approach yields brightly luminescent SiQDs with diameters starting from 2.4 nm with quantum yields of up to 20% and excellent colloidal stability across solvents of varying polarity. Spectrally resolved lifetime analysis uncovers a near-unity internal quantum yield for bright SiQDs and reveals how surface chemistry and aggregation govern dark-to-bright QD population ratios and photoluminescence quenching. Additionally, we simplify the well-established protocols of thermal hydrosilylation, showing that controlled-atmosphere sample collection without any further purification steps is a necessary condition for obtaining monodispersions with good optical properties. These results define a simple route to functionally engineered SiQDs, providing new insight into emission dynamics and establishing a strong foundation for their integration into advanced photonic, bioimaging, and energy-harvesting devices.
The most common approaches for the synthesis of photoluminescence (PL)-emitting SiQDs are: (i) low-15–17 or atmospheric-pressure18,19 plasma synthesis from the gaseous (e.g. silane) or even liquid precursors, (cyclohexasilane20) and (ii) the thermal disproportionation of silicon-rich silicon oxide such as hydrogen silsesquioxane21 (HSQ), triethoxysilane22 or in layered plasma-deposited superlattices.23 Both the methods are capable of producing SiQDs with a relatively narrow (±30%) size distribution. Other synthesis methods include solution synthesis from e.g. halide salts or alkali silicides,24 some of which have been recently critiqued due to the potential production of light-emitting carbon QDs.25–27 Surprisingly, SiQDs can even be synthesized from rice husks.10
The advantage of the disproportionation approach is the low initial cost of the precursor material and good control over the size of the resulting SiQDs. Its main drawback is a combination of energy-extensive (e.g. high temperature annealing at 1100 °C) and time-consuming (e.g. grinding) steps and the use of dangerous chemicals (hydrofluoric acid, silanes formed during the annealing steps21,28). In contrast to that, low-pressure non-thermal plasma synthesis (LP-NTP) is faster with fewer steps and lower energy consumption, even though it requires rather expensive vacuum equipment. The precursor mixture of 1% silane in argon is not flammable and can be bought pre-mixed in a cylinder.17,29 The good control over the size and structure of the resulting SiQDs can be achieved by adjusting the precursor flow, residence time (time spent in the plasma discharge) and plasma geometry.30 Both plasma synthesis and thermal disproportionation lead to hydrogen-terminated surfaces (SiHx, x = 1, 2, and 3), even though they can potentially lead to structurally different surfaces with different surface reactivities.31 Hydrogen-terminated H:SiQDs are strongly prone to oxidative processes when exposed to atmospheric oxygen and water vapor. Thus, strict control of air exposure is required if other than oxide-based termination is sought.
The state-of-the-art surface modification is hydrosilylation using long-chain alkyls.2,32 The original thermal hydrosilylation method, based on the homolytic cleavage of Si–H occurring at ≈150 °C, limits the ligand choices only to high temperature boiling liquids.33,34 As an alternative, a radically initiated (using e.g. 2,2′-azobis(2-methylpropionitrile) (AIBN) or 1,1′-azobis(cyclohexanecarbonitrile) (ABCN)),35,36 photoinitiated,37 or microwave assisted hydrosilylation reaction38 can be employed. Interestingly, even room-temperature hydrosilylation was introduced for specific molecules (e.g. styrene).39 The disadvantages of these processes include the usage of expensive and persistent catalysts, expensive mediator chemicals, the potential size dependent reactivity35–37 and a long reaction time, ranging from several hours to days.40 Due to the sensitivity of the reactants to atmospheric oxygen and humidity, the hydrosilylation process is typically carried out under an inert atmosphere (commonly in glove boxes) and several freeze–pump–thaw cycles of the solvents using the Schlenk line are necessary.35 Therefore, there is still room for improvement if these methods were to be broadly used.
An important aspect of the modification process is the need to expand the variety of termination molecules to achieve dispersions of SiQDs in environments of different polarities, from highly polar such as water and ethanol to non-polar such as toluene. As of now, water-based dispersions achieved through polar terminal groups are problematic despite their importance for bioapplications.11,41,42 Here, a possible alternative to the hydrosilylation process is the employment of non-thermal plasma (NTP) discharge to initiate the plasma-induced in-liquid reactions (PILRs). The discharge provides a highly reactive and reactant-dense medium, leading to fast kinetics of the initiated chemical reactions while keeping the process temperature low. Moreover, NTP can provide a wider range of ligands because the need for the terminal double bond in a hydrosilylation process is replaced with the generation of highly energetic electrons that can dissociate weaker bonds.43,44 The NTP-based surface modification is also tunable by experimental geometry, employing a spark, a jet, or a corona discharge in the gas phase43 or point-to-plane microplasma45,46 in a liquid-to-gas interface. The PILR method is also easily up-scalable, e.g. by deploying parallelly connected reactors. Recently, the point-to-plane microplasma geometry was used to enrich oxidized SiQDs with nitrogen-based species using only air and water as the source of chemicals47 with a fast reaction time from 30 to 40 minutes if the geometry of the experiment was optimized to restrict the air flow to the reaction vessel.48 The potential of the PILR is supported by other published pioneering works, which focused on reactions induced in a water environment and attachment of short alkyl molecules (e.g. ethanol) using a mixture of the alkyl liquid and water for the plasma initiated reactions,42,45,49 or on the preparation of oxidized water dispersible SiQDs with photoluminescence quantum yields (QY) reaching 50% using a mixture of ethanol and water and an argon plasma jet.42 As PILR does not proceed in a completely water- and oxygen-free environment, the expected modification outcome if organic groups are used as the prospective ligand is alkoxylation combined with a degree of oxidation of the surface. Even if alternative approaches to alkoxylation exist,50–52 PILR represents a promising alternative or extension to hydrosilylation, broadening the variety of terminating groups, offering up-scalability and significantly decreased reaction times.
Apart from preventing the uncontrolled oxidation process and tuning the dispersibility in different polar environments, modification techniques are commonly employed to impart stability and enhance PL properties. Even though more PL channels exist,53–56 PL is typically represented by a broad PL band tunable between the red visible spectral region and the near infrared region (size ranging from ca. 2 to 7 nm), with photoluminescence QYs often close to 5%, but sometimes reaching22,36,57,58 20% or even 60%.59 Also, as has been shown recently,60 due to long radiative lifetimes of this PL channel, dark QDs are often responsible for the lower QYs, while the quenching mechanism in dark SiQDs still remains uncertain.
Therefore, finding a trade-off between dispersibility in environments with different polarities, tunability of sizes, stability and emission properties using a fast, technically non-demanding and up-scalable process is still a substantial and challenging task. In this regard, this article represents a comprehensive overview of the LP-NTP synthesis and basic modification procedures in SiQDs. In addition to a detailed discussion of the standard fabrication and characterization methods, we put emphasis on simplifying the modification and reaching good dispersability in environments with a broad range of polarities. Specifically, using our synthesis protocols, we were able to tune the sizes of the produced SiQDs in a broad range (2.4–6 nm) predominantly by increasing the hydrogen flow in the synthesis gas mixture. Moreover, we showed that it is possible to reach excellent dispersibility, a low degree of oligomerization of surface ligands and good optical performance in comparison with typical samples utilizing basic thermal hydrosilylation. In particular, PL quantum yields reach 20% and lifetimes of the emitting QDs are fully radiative. We used a simple collect-and-cook approach, where the collection in a protective atmosphere and heating in argon-filled closed containers were the only protective and purification steps necessary in the procedure. Additionally, we introduced a modification method based on pulsed NTP-microplasma-initiated reactions (PILRs). The PILR-based air-free surface modification offered much shorter reaction times than hydrosilation (45 minutes vs. tens of hours). It also removed the requirement for the terminal double bond in the ligand to be attached, leading to mostly alkoxylated surfaces and dispersibilities in more polar environments. Last but not least, we applied a dedicated optical characterization method that we recently introduced,60 which confirmed a similar PL dynamics in hydrosilylated, carbon-linked and PILR-produced alkoxylated samples. This similarity in PL dynamics underscores the importance of identifying the mechanisms behind dark QDs which then determine the overall PL performance. Our quantification of the fraction of dark SiQDs allowed us to identify aggregation as one factor contributing to PL quenching through dark SiQDs.
This paper is structured as follows. Section 2 contains the details of the applied methods. Section 3.1 describes the synthesis and PILR surface modification. Section 3.2 introduces our approach to thermal hydrosilylation. The two following sections, sections 3.3 and 3.4, are devoted to the structural, chemical and optical characterization of the fabricated SiQDs. The paper closes with conclusions in section 4.
| Label | t (ms) | Mixture (sccm) | H2 (sccm) | Ar (sccm) | XRD size (nm) | aa,b (Å) | Sizec,d (nm) | dDLS (nm) | PL pos. (eV) | QYc (%) |
|---|---|---|---|---|---|---|---|---|---|---|
| a NIST standard Si standard reference material a = 5.43102 Å.b The lattice parameter for the S sample could not be precisely refined due to extremely broad diffraction peaks.c Measured for dodecyl:SiQDs.d Derived from HRTEM measurements.e Derived from the first DLS band. | ||||||||||
| EL-SiQDs | 28 | 80 | 0 | 0 | 4.0 ± 1.2 | 5.426 ± 0.002 | 6.3/4.8 | 25.0 ± 1.5e | 1.25 | — |
| L-SiQDs | 23 | 80 | 10 | 0 | 3.4 ± 1.1 | 5.427 ± 0.002 | 5.5 ± 0.6 | 19 ± 5 | 1.32 | 9.6 ± 0.7 |
| M-SiQDs | 17 | 80 | 40 | 0 | 2.8 ± 0.9 | 5.429 ± 0.004 | 4.0 ± 0.6 | 12.0 ± 2.5 | 1.43 | 19 ± 3 |
| S-SiQDs | 12 | 40 | 100 | 40 | 1.9 ± 0.8 | — | 2.44 ± 0.22 | 8.7 ± 0.8 | 1.76 | 5.2 ± 0.5 |
500 × g for 120 minutes due to the high viscosity of octanol. The purified SiQDs were stored in 1-propanol (isopropyl alcohol (IPA)). The remaining SiQDs were kept in the original liquid (not purified). The purification process was performed three days after the reaction process, as the maceration of the SiQDs in the reaction mixture in an argon filled vial under sealed conditions was observed to lead to a better purification material yield and better optical properties. The argon atmosphere and sealed conditions prevent the exposure to air and humidity, and therefore prevent oxidation.
:
1 ratio. The used centrifuge was a Beckman Coulter Optima Max-XP with a TLA-110 fixed-angle rotor equipped with 3.2 ml open-top thick-wall polypropylene centrifuge tubes. The centrifugation parameters varied based on the SiQD size from 48
900 × g for 35 min for the largest SiQDs to 195
500 × g for 45 min for the smallest SiQDs. The purified samples with dodecyl capping (dodecyl:SiQDs) were then dispersed and kept in toluene. The purification process was done three days after the reaction process, the same as in the case of the PILR samples, as the maceration of the SiQDs in the reactant mixture was observed to lead to a higher material yield of the purification and better optical properties. The maceration process was done in the sealed reaction vial filled with argon without the extraction of the dispersion of SiQDs in 1-dodecene to prevent air and humidity contact with the dispersion.
The sizes and their distributions of the SiQDs were determined using XRD and high-resolution transmission microscopy (HRTEM). The used HRTEM is a JEOL 2200 FS using a ZrO/W FEG operated at 200 kV. The data from the HRTEM were analysed manually using the ImageJ software (we verified that the extracted histograms are independent of the person carrying out the analysis). X-ray diffraction (XRD) experiments were conducted using a SmartLab X-ray diffractometer (Rigaku, Japan) equipped with a 9 kW rotating Cu anode, Johansson monochromator (producing monochromatic radiation with wavelength λ = 1.5406 Å), and 5° Soller slits to eliminate axial divergence in both primary and diffracted beams. The diffracted intensity was measured using a 2D hybrid pixel, single photon counting HyPix 3000 detector. The measurements were performed in a para-focusing Bragg–Brentano geometry with constant irradiated area mode, covering the 2θ range of 15°–150° with a step size of Δ2θ = 0.05° and a scan speed of 2° min−1. The XRD data were analyzed using the whole powder pattern fitting technique (Rietveld method) to derive structural parameters such as crystallite sizes, lattice strain, and lattice defects of the nanocrystalline Si phase. The computer program MStruct61 was employed for the fitting. The size distribution of coherently diffracting domains (crystallite size) was modeled using the lognormal distribution.
QY measurements were carried out using the absolute method on a non-commercial setup, based on the Energetiq Laser Driven Light Source EQ99-X as the excitation light source and a Thorlabs IS200-4 integrating sphere. The white light excitation was fed through an MSH 150 monochromator to set the excitation wavelength and then it was coupled to the Thorlabs M28L01 optical fiber (a diameter of 400 μm, 0.39 N.A.) using a pair of planoconvex lenses. The chosen excitation wavelength was 400 nm. For the QY measurements of the colloids, a micro-cuvette (Hellma Micro-cuvette 111.057-QS, 5 × 5 mm) with a round Teflon stopper was used. The collected signal was coupled by an optical fiber into the monochromator and detector (Shamrock 300 and a Newton 971 EM-CCD camera). The detailed acquisition protocol has been published elsewhere.62
The photoluminescence dynamics was measured using the Hamamatsu C10627 streak camera (reaching a temporal resolution of 15 ps) coupled with an imaging spectrometer. The SiQD colloids were excited using a femtosecond laser PHAROS (150 fs pulses, Light Conversion) coupled with a harmonics generator HiRO (Light Conversion, excitation wavelength 343 nm, and repetition rate 1 kHz). The optical signal was collected at a 90° angle. All the optical measurements were performed under room temperature conditions. The spectra were corrected for the spectral sensitivity of the whole setup.
The measured lifetimes were analyzed using a home-built Matlab code.63 Typically, the decays were well-described by a stretched-exponential curve60
, τSE being the stretched-exponential lifetime and β the stretched-exponential parameter. The corresponding average lifetimes τ were then calculated as60
![]() | (1) |
| Label | Surface type (solvent) | PL blue shift (eV) | PL rel. enh. | β | Dark-to-bright QDs (Ndark/Nbright) | τSE of int. PL (μs) |
|---|---|---|---|---|---|---|
| L-SiQDs | Dodecyl (in TOL) | 0.07 | 22.5 | 0.6 | 9.4 : 1 |
34.4 ± 0.8 |
| Octoxy (in OCT) | 0.16 | 18.9 | 0.7–0.8 | 4.5 : 1 |
43 ± 1 | |
| Ethoxy (in EtOH) | 0.12 | 3.4 | 0.65–0.75 | 49 : 1 |
48.1 ± 0.7 | |
| M-SiQDs | Dodecyl (in TOL) | 0.17 | 6.4 | 0.8 | 4.2 : 1 |
56 ± 1 |
| Octoxy (in OCT) | 0.13 | 12.5 | 0.7–0.8 | 5.9 : 1 |
30.3 ± 0.7 | |
| Ethoxy (in EtOH) | 0.10 | 5.8 | 0.7–0.8 | 6.9 : 1 |
30.9 ± 0.5 | |
| S-SiQDs | Dodecyl (in TOL) | 0.13 | 7.2 | 0.7 | 18 : 1 |
20.6 ± 0.4 |
| Octoxy (in OCT) | 0.29 | 1.8 | 0.75 | 27 : 1 |
30.3 ± 0.7 | |
| Ethoxy (in EtOH) | 0.11 | 2.5 | 0.65–085 | <30 : 1 |
30.9 ± 0.5 |
Moreover, we optimized our system and synthesis protocols for material yield. The conversion rate of SiH4 in the reactor reaches more than 75% based on the ratio of total weights of the precursor gases to collected SiQDs, leading to an overall yield of more than 60 mg per hour. To avoid overheating, in a high-material-yield synthesis, the generation of nanoparticles (plasma discharge ON) step is alternated with a cooling step (plasma discharge OFF) in a 3
:
1 duration ratio. The sequence can be repeated to achieve an overall process time of up to 60 minutes. With the decrease in the diameter of the synthesized SiQDs, the material yield decreases and the duration of one sequence is reduced to 5 minutes, to ensure the synthesis of SiQDs without surface burning or any other damage.
The general model for the growth of Si nanoparticles in non-thermal plasma involves three stages of nucleation, coagulation and surface growth while maintaining sufficiently energetic conditions in the plasma to ensure crystallization.17 In our protocols, while keeping the power setting constant to ensure high crystalline quality, the size of the produced QDs is primarily tuned by adding H2 to the synthesis gas mixture. The increased overall flow decreases the residence time for the nanoparticles to form. At the same time, it introduces an etching-like mechanism65 to the surface-growth phase of the nanoparticle formation, effectively competing or interfering with the growth in size. Consequently, the SiQDs synthesized with an additional H2 flow have a different chemical composition of terminating surface hydrides and different surface facets, as shown in our previous work.31
Plasma conditions for the smallest S-SiQDs are the most difficult to fine-tune as the right balance between conditions energetically ensuring crystallization, a sufficiently short residence time and chemical processes during the synthesis need to be reached. The S-SiQD sample was optimized for reasonable optical performance, which is typically poor in very small SiQDs. Even though the small size was primarily reached by the same mechanisms as for the larger QDs, i.e. by using the highest H2 flow rate, in this sample, half of the flow of the 1% SiH4 mixture was replaced with pure Ar. This setting slightly increased the amount of energy-supplying argon in the synthesis gas at the expense of silicon available for nanoparticle formation. Potentially, such fine-tuning might also influence the coagulation phase during the formation of nanoparticles and act as a selection mechanism for sufficiently crystalline small SiQDs. Therefore, by increasing the H2 flow accompanied by potential fine-tuning of the synthesis gas composition, we can obtain a broad range of core sizes (2.45–6 nm), while keeping a reasonable degree of crystallinity (see section 3.3.2 thereafter) and optical performance (see section 3.4 thereafter) even for the smallest QDs. However, size tuning also influences the material yield, which is ≈3× lower for the S-SiQD than for the L-SiQD sample.
Therefore, our setup consisted of a minimalistically designed 3D printed protection reactor box with a screw-attached and sealed lid (PILR-Box), see Fig. 1B. The box contained one 5 ml reactor and was flushed throughout the entire reaction process with Ar gas. The as-synthesized SiQDs were collected in a Synth-Box attached to the synthesis system, placed in a 20 ml glass vial filled with an argon-purged reactant liquid and a Teflon cap was screwed on the top of the vial. Then, the dispersion in the glass vial was taken out of the Synth-Box and 3 ml of the dispersion were pipetted into a 5 ml glass reactor placed in the PILR-Box. The PILR-Box was sealed, with the electrodes in place in the glass reactor, and flushed with argon (flow: 1 l min−1). After the flushing cycle, the plasma discharged was ignited, see Fig. 1C. The overall reaction process time for all ligands was 35 minutes. Next, the PILR-Box was flushed with argon, unsealed and the dispersion of the modified SiQDs was extracted. The after-reaction dispersions for M- and L-SiQDs in reactants are shown in Fig. S1A and S1B, respectively.
We tested a set of liquids to cover the interval from polar to non-polar molecules to achieve dispersions in different environments, in particular ethanol (EtOH), acetic acid, octan-1-ol (OCT), the toluene–phenol mixture and 1-dodecene. The molecules were also chosen to be conductive, so the plasma discharge can burn towards them. While PILR modification occurred in all the liquids, the best results ensuring surface stabilization and photoluminescence were achieved using EtOH and OCT as a reactant and therefore, these two types, labeled as etoxy:SiQDs and octoxy:SiQDs, will be discussed in more detail. The summary of the influence of other passivants is provided in Table S1.
In short, acetate derived from acetic acid was tested as a highly polar ligand. Significant PL enhancement (14×) was achieved, but the extraction from the reactant turned out to be difficult. As for the toluene/phenol mixture, where toluene was used to dissolve solid phenol, a non-polar environment and aromatic termination were targeted. However, the PILR treatment of this mixture was problematic due to low conductivity resulting from the non-polar nature and led to a mere 1.5× PL enhancement. Actually, a larger PL enhancement was achieved when the SiQDs were solely left to macerate in the mixture. Also, the purification process was problematic due to the solid state form of phenol. Lastly, non-polar 1-dodecene was also used as a PILR reactant. In this way, a moderate 2× PL enhancement was achieved. Once again, the PILR procedure was complicated by the instability of the discharge because the non-conductive nature of 1-dodecene and PILR-treated dodecyl:SiQDs exhibited similar PL properties as H:SiQDs simply left to macerate in 1-dodecene. In this regard, the conventional hydrosilylation (see section 3.2) was clearly superior. Therefore, our experiments demonstrate that the PILR procedure is not ideal for non-polar ligands. However, as non-polar termination is easily achievable through well-established hydrosilylation techniques, PILR can serve as an important additional tool to cover the spectrum of more polar ligands, if the protocols are further developed into a more matured state.
As a sidenote, when the octan-1-ol (OCT) liquid was used as the reactant, the sample needed to be purified for the FTIR analysis, which would otherwise be complicated in a low volatile liquid. The purification process was carried out via one centrifugation/precipitation cycle in a propan-2-ol/acetonitrile solvent/antisolvent pair with propan-2-ol (IPA) as a final (storage) solvent. IPA was chosen as the storage solvent due to its mildly polar nature; however, the modified octoxy:SiQDs do not disperse in IPA ideally.
Therefore, we compared two approaches, namely SiQDs transferred to liquid-containing vials in the protected atmosphere in Synth-Box (‘inert atmosphere synthesis’ or IAS, see section 2.3) with those undergoing a short air exposure of approx. 30–90 seconds necessary for the dry powder to be dispersed in the reactant liquid outside of the Synth-Box (‘air exposure synthesis’ or AES, see section 2.4). The hydrosilylation reaction was than performed under standard laboratory conditions without any additional atmosphere control equipment (see section 2.3) in contrast to the traditionally employed Schlenk line-based systems.16,35
Even naked-eye observation of the dispersion of modified SiQDs revealed notable differences between the two approaches. Whereas the IAS approach led to transparent orange-yellow dispersions, see Fig. S1A for the corresponding photos, the dispersions of AES-modified SiQDs were much more opalescent (for photos, see Fig. S1A), implying that non-negligible oxidation-induced agglomeration occurred despite the short air exposure.
Thus, we put forward a slightly simplified version of thermal hydrosilylation carried out in an argon-filled closed container using pure 1-dodecene purged with argon as the reactant, without the freeze–pump–thaw degassing cycles or any other protective-atmosphere equipment (inert atmosphere, Schlenk lines) or purification processes while reaching reasonable optical performance (see section 3.4 thereafter). As a contrast to this simplification step, we show that even a very short-term exposure of the dry SiQD powder to air and humidity needs to be avoided if hydrosilylation is to proceed successfully and a protective-atmosphere Synth-Box filled with non-dried 5.0 purity nitrogen is a necessary minimal requirement for the collection of the sample.
:
1 in favor of the larger SiQD size.
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| Fig. 2 SiQDs’ size and structure: (A) a representative example of a bright-field HRTEM image of L-dodecyl:SiQDs produced using the non-thermal plasma system for the synthesis and the IAS hydrosilylation approach. (B) Histograms of sizes of dodecyl-terminated samples from Table 1 derived from HRTEM images. (C) Measured (open circles), calculated (solid lines) and difference (yellow line at the bottom) X-ray diffraction patterns of the studied samples. For the quantification of the size and lattice constant, see Table 1. (D) Lognormal fit of the diameter distribution acquired from XRD measurements for the studied SiQDs. (E) Comparison of the difference of SiQDs’ mean sizes derived from XRD and HRTEM measurements, comparison with the dependency observed by Thiessen, A. et al.66 is included. | ||
The presence of a symmetrical distribution of sizes is an atypical, although possible,68 feature, because sizes of nanoparticles often exhibit asymmetry with a larger-size tail, commonly approximated by a log–normal distribution.69 Potentially, the symmetrical size distribution can be tied to the extremely short times needed for particle formation (residence times 10–30 ms) and the suppression of agglomeration of the forming QDs due to negative charging in the plasma.64 Another notable feature here is the bimodal distribution of the largest SiQDs synthesized without an additional H2 flow. This qualitative difference between the largest SiQDs and the smaller ones suggests that the additional H2 flow might in fact promote the coagulation of the forming QDs, consequently yielding a single-size distribution. Lastly, we want to highlight the wide range of sizes accessible with our protocols. The smallest S-SiQDs are among the smallest SiQDs fabricated by the LP-NTP.2,15,36
For the purposes of the comparison with XRD (see section 3.3.2 thereafter), where the change of the underlying shape of the size distribution for the analysis is non-trivial, the HRTEM-derived size histograms were refitted with a lognormal distribution, see Fig. S4 and Table S2. The Gaussian fit gives a consistently higher R2, implying a better agreement with the fitted data, and therefore, the size distribution of the studied samples is represented by these Gaussian fits in the following text. However, realistically, the difference between the Gaussian and lognormal distributions both in terms of the shape and the determined values is marginal. Therefore, the parameters of the HRTEM distributions can be directly compared with the XRD-derived ones.
m, no. 227). Additionally, a fraction of an amorphous phase (or disorganized atoms) is also present, as indicated by the broad peak between the diffraction angles of 15–40°. The refined, number-weighted crystallite size distributions are shown in Fig. 2D, their mean values and lattice constants are listed in Table 1. Lattice strain increases with decreasing crystallite sizes, accompanied by an increase in stacking faults. Across all samples, the lattice parameter is slightly smaller than the tabulated value for bulk Si. The difference ranges between 0.04 and 0.09%, getting closer to the bulk value for smaller QDs. As XRD probes a macroscopic amount of QDs, the perfect agreement between the measured diffractogram and the fit shown in Fig. 2C implies that the XRD-derived size distribution in Fig. 2D represents the volumetrically dominant fraction, and no significantly larger nanoparticles are present.Sometimes, the Scherrer formula is used to determine the mean size68 instead of the whole powder pattern fitting (WPPF) method applied here. In general, in nanocrystalline materials, WPPF is more reliable for crystallite size determination than the Scherrer method because it accounts for the full complexity of peak broadening effects. The Scherrer method, while simple, assumes that broadening arises solely from the small crystallite size and typically uses a single peak, ignoring contributions from microstrain and peak asymmetry, all of which are significant in nanomaterials. In contrast, WPPF fits the entire diffraction pattern using a physically meaningful model that simultaneously considers size, strain, and instrumental effects across multiple peaks. This holistic approach provides a more accurate and representative measurement of crystallite size in nanocrystalline materials, where line broadening is often substantial and affected by several overlapping factors. A comparison of the application of WPFF and the Scherrer formula to our samples is shown in Table S2, where the Scherrer formula systematically yields somewhat larger sizes, however, the difference is not significant in our case, usually around 10%. This relatively small difference is caused by the well-defined size distribution in our samples; a potential presence of, e.g., larger particles resulting in a bimodal distribution would lead to a more significant disagreement between the WPPF- and Scherrer-derived size distributions.
To further confirm the crystalline quality of the produced SiQDs, we tested if they can withstand HF etching in ethanoic, ≈40% HF (see section 2.7). The procedure was carried out in both freshly synthesized H-terminated and slightly pre-oxidized SiQDs. After 45 minutes of etching, a highly murky dispersion of toluene-dispersed SiQDs was collected for all the produced sizes of QDs. An exception was the pre-oxidized S-SiQD sample, which dissolved in the etching mixture and the QDs were retrieved. The dissolution of this sample was most likely due to very small size exacerbated by the oxidation (freshly synthesized S-SiQDs withstood the procedure). This resistance to HF confirms the high crystalline quality of the produced SiQDs.
The comparison of HRTEM- and XRD-derived size distributions then gives evidence of much more pronounced asymmetry and larger width detected by XRD (approx. 10 and 30% with respect to the mean size for the HRTEM and XRD, respectively). In principle, the differences between the shapes of the XRD- and HRTEM-derived size distributions could be connected to the size-dependent shape thickness as plotted in Fig. 2E, but the corresponding discussion is beyond the scope of this article.
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Fig. 3 Modified SiQD surface: (A) comparison of the SiQDs’ surfaces of the as-synthesized, naturally oxidized and dodecyl:SiQDs prepared by both the inert atmosphere synthesis (IAS) and air exposure synthesis (AES) approaches (see section 3.2 for details). (B) Comparison of the SiQDs’ surfaces modified by conventional hydrosilylation (dodecyl:SiQDs), the PILR method using the ethanol (ethoxy:SiQDs) and octanol liquids (octoxy:SiQDs). The detailed area from 1400 to 600 cm−1 was expanded for an easier comparison with the FTIR spectra of Si : H and Si : O (color corresponds to (A)). (C) DLS measurements of dodecyl:SiQDs from Table 1, including the comparison of the ILS and AES methods for the M sized sample. (D) Schematic illustration of the dodecyl bonding to the SiQDs’ surface (see eqn (2)). (E) DLS measurements of M-dodecyl:SiQDs, M-etoxy:SiQDs and M-octoxy:SiQDs showing the dispersibility potential of selected surface terminations. | ||
C bond at 1675 cm−1, see the corresponding dodecyl:SiQDs IAS spectrum (Fig. 3A).FTIR spectroscopy also revealed subtle differences between the AES and IES protocols (section 3.2), see again Fig. 3A. First, the AES approach led to a slightly more intensive signal from the Si–O–Si vibration (around 1070 cm−1), implying a more oxidized surface. Although the oxidation level in the AES- and IAS-hydrosilylated SiQDs was, according to the FTIR spectra, minuscule, it was sufficient to induce interparticle aggregation, in agreement with the less transparent and more opalescent liquid obtained by the AES hydrosilylation process. The second difference was represented by the two weak peaks at 3080 cm−1 and 1675 cm−1 in the dodecyl:SiQDs (AES) samples, originating from the asymmetric vibration of the terminal CH2 group on a double bond and the stretching of the C
C bond, respectively. We tentatively attribute these peaks to a dodecene capsule around the agglomerates of QDs in the AES samples. This could imply that the thermal hydrosilylation using the AES procedure was carried out partially, due to the oxidized surface, resulting in aggregation and a smaller number of reactive sites.
O in combination with a broad signal at 3250 and around 1340 cm−1 from CO–O– groups can be attributed to acetic acid, which can be produced in the interaction of plasma with EtOH.84,85 The weak signal from 3400 to 3100 cm−1 from the O–H stretching is assigned to the residues of the acetic acid and not evaporated ethanol. Therefore, the PILR-modified etoxy:SiQDs are terminated with a mixture of Si–O–C-bonded ethoxy group, surface oxide and acetate groups.
| dDLS = n(dDLS-min + 2lligandN + lC–C–CM), | (2) |
| dDLS-min = d + 2lligand. | (3) |
Eqn (2) and (3) help us interpret the results of the DLS measurements in Fig. 3C. Starting with the IAS samples, which exhibit better dispersibility, the S- and M-dodecyl:SiQDs narrow DLS-derived size distributions peak at around 9 and 12 nm, respectively. Taking into account the corresponding minimal hydrodynamical diameters (dS-dodecylDLS-min = 5.5 nm, dM-dodecylDLS-min = 7.0 nm), we expect monodispersion (n = 1) with a low degree of oligomerization and branching (n = 1, N = 1, M ≈ 2–6). The maximum size distribution of L-dodecyl:SiQDs at around 19 nm (dL-dodecylDLS-min = 8.5 nm) could imply agglomeration (n = 2). However, the lack of a tail in the size distribution towards dL-dodecylDLS-min rather signifies a higher degree of oligomerization (n = 1, N = 4). The EL-dodecyl:SiQDs (dEL-dodecylDLS-min = 9.3 nm) then exhibit a bimodal size distribution with maxima at 25 and 127 nm, respectively. In line with the reasoning offered for the L-dodecyl:SiQD sample, we interpret the first peak as monodisperse QDs with oligomerized and likely branched surface ligands (n = 1, N ≈ 10, M > 0). The second broader peak can then be attributed to agglomeration (n = 15–20), possibly induced by the bimodal distribution of the QDs before hydrosilylation (see Fig. 3C). This interpretation tentatively implies that the less reactive surface31 of the larger QDs leads to a higher degree of oligomerization. This trend is to be expected, because a lower number of reactive sites promotes reactivity on the chains. Notably, solely based on DLS, the potential aggregation due to improperly passivated partially oxidized surface cannot be ruled out, but we do not expect aggregation to be dominant in this case due to the small oxide-related signal observed in FTIR (Fig. 3A).
To study the difference between the two approaches to hydrosilylation (see section 3.2), DLS measurements of AES- and IAS-modified M-dodecyl:SiQDs are compared in Fig. 3C. The AES hydrosilylation with short air exposure leads to a broader size distribution with a maximum at around 35 nm. Thus, even the minuscule difference in surface oxidation detected by FTIR in the AES procedures (see Fig. 3A) increases the QDs’ tendency to oxidize and form larger aggregates with partially oxidized oligomerized surface ligands (n = 3–12, N up to 7), as confirmed by the increased oxide-related FTIR signal in Fig. 3A.
For M-etoxy:SiQDs, we obtained a narrow size distribution with a maximum at 7 nm compared to dDLS-min = 4.9 nm. However, in this case, due to the extremely short length of the terminating groups, solvent restructuring and thus the thickness of the solvation shell detected by DLS are expected to exceed the simple chain length,90 and therefore, a 1.5 nm solvation shell thickness derived from the difference of the HRTEM- and DLS-derived mean sizes is fully consistent with a monodispersion of ethoxy:SiQDs. For M-octoxy:SiQDs, we obtained a narrow size distribution, a maximum close to M-dodecyl:SiQDs at 15 nm (dM-octoxy:SiQDsDLS-min = 6.4 nm). Therefore, unless oligomerization occurs also in octoxy groups, M-octoxy:SiQDs form clusters or partially functionalized aggregates of 2–3 QDs after surface modification. In contrast, after purification and redispersion in IPA, the size distribution maximum at 52 nm points towards a higher degree of aggregation. For other sizes of the SiQDs (L- and S-), we found a similar behavior in the case of the octoxy terminated surface, leading to a narrow dispersion in the interval from 12 to 15 nm for the octoxy:SiQDs in OCT, see Fig. S5. This implies that the S- and L-octoxy:SiQDs formed agglomerates or aggregates of 4 or 2 QDs, respectively. For octoxy:SiQDs in IPA, high tendency towards aggregation was detected with distributions for L- and S-SiQDs around 100 nm. Similarly, etoxy:SiQDs were more aggregated for the L- and S-sizes with DLS dispersion maxima of 110 and 55 nm (≈20 QDs), respectively.
To quantitatively compare the optical properties, photoluminescence quantum yield (QY) measurements were carried out,62 see Fig. 5A. The S-SiQD samples have the lowest PLQY overall, but the values are very similar for all the surface modifications (≈5%). The QYs of the M and L-SiQD samples vary between 10 and 20%, with the highest QY for the M sample achieved with dodecyl termination (20%), and the highest QY for the L sample achieved with octoxy termination (18%). However, the purification and IPA redispersion of octoxy:SiQDs systematically lower the QY. The QY values of the etoxy:SiQDs are consistently lower despite low agglomeration, the best QY is observed with the ethoxy surface ligand in M-etoxy:SiQDs (12%). The overall trend of QY values peaking for SiQD samples emitting at around 850 nm is analogous to other publications.91–93
![]() | ||
| Fig. 5 Photoluminescence properties of the studied SiQDs. (A) Measured photoluminescence quantum yield for different sample sizes and types of surface modifications. (B and C) Average photoluminescence lifetimes (data points) deduced from single stretched-exponential fits are compared with the values of fully radiative lifetimes60 (black curves and gray bordered area) in SiQDs for the dodecyl (B) and octoxy (C) surface modification (see the text for details). The black curve marks the fully radiative lifetimes, the gray bordered areas are 66% prediction bands. The β parameters of the stretched-exponential decays are listed in the legends, fit ambiguity coefficients60 p are listed in each panel. Inset in (B) (photon-map) shows that one data point refers to the average lifetime for the selected wavelength. | ||
To carry out the analysis, a set of emission-photon-wavelength dependent PL decays was collected for each sample and these decays were subsequently characterized63 using the corresponding average lifetimes τ (see eqn (1) in section 2.10), which allow for a meaningful comparison among independent measurements.60
In dodecyl:SiQDs, the PL decays were well-characterized using a single stretched-exponential curve (see section 2.10). As follows from the reasoning explained in ref. 60, the obtained average photoluminescence lifetimes in dodecyl:SiQDs are very close to the fully radiative values, see Fig. 5B, implying that the emitting dodecyl:SiQDs have internal QY60 ηdodecylI close to 1. The emitting subset of SiQDs will be referred to as “bright”. The decrease of the measured ensemble-averaged QY η from the ideal 100% values as seen in Fig. 5A is then caused by the presence of non-emitting, or “dark” QDs, whose fraction
can be easily estimated as60
![]() | (4) |
The estimated ratios of dark-to-bright dodecyl:SiQDs, ranging between 4 and 20
:
1, are listed in Table 2.
In octoxy:SiQDs, PL decays differed for samples prior to and after the purification procedure. The PL decays of octoxy:SiQDs stored in octanol were practically identical to those of dodecyl:SiQDs, including the fully radiative values and the consequent close-to-unity ηI. In contrast, the PL decays of purified octoxy:SiQDs in isopropanol consist of two components, as a much faster, resolution-limited component appeared in addition to the traditional long-lived one, see Fig. S7C. The average lifetimes τ calculated solely for the long-lived component (Fig. 5C) again well correspond to the fully radiative values, with the exception of purified L-octoxy:SiQDs, where the measured τ is systematically shorter. Based on the methodology introduced in ref. 60 (see eqn (7) therein), we can easily calculate, using the data from Fig. 5C, the scaling factor C of the experimental average lifetimes τL-octoxy:SiQDs to the ideal fully radiative ones τrad as C = τL-octoxy:SiQDs/τrad = (0.866 ± 0.006). This scaling factor immediately yields the estimated internal QY of ηL-octoxy:SiQDsI = C ≈ 0.85. Thus, unlike the remaining samples, the purified L-octoxy:SiQDs emitting the long-lived PL are not ideally bright with a clear presence of a long-lived non-radiative channel.
Moreover, in addition to the long-lived PL channel, all the purified octoxy:SiQD samples exhibit an additional faster component with only a weak emission-photon-energy dependence, see Fig. S7D. The most straightforward interpretation of this faster component is emission strongly damped by relatively fast non-radiative processes, resulting in the weak emission–photon-energy dependence. Therefore, this component can be tentatively ascribed to “gray” QDs, most likely originating from the agglomeration of QDs observed in IPA. The complex makeup of these samples, containing “bright”, “gray” and “dark” sub-populations of QDs, prevents us from applying the simple methodology60 for the estimation of the ratios of the individual sub-populations. Nevertheless, the proposed interpretation is fully consistent with the trends observed in the measured ensemble-averaged QY values in Fig. 5A, where (i) a ≈2× decrease in QY is observed between non-purified and purified samples, due to the presence of “gray” QDs in the latter, and (ii) an additional QY decrease is detected between the purified M- and L-octoxy:SiQDs as a result of the long-lived non-radiative channel in the L sample. This can be correlated with the higher degree of agglomeration for the L-octoxy:SiQDs in IPA, ca. 100 nm (see Fig. S5) and a lower degree of agglomeration in M-octoxy:SiQDs in IPA (ca. 52 nm, see Fig. 2D).
Additionally a fast yellow PL component appears in octoxy:SiQDs, especially in the M-octoxy:SiQD sample, see Fig. S8A. We note that this component persists in the sample even after the centrifugation-based purification procedure. We verified that it is not present in the reference sample of plasma-initiated octanol without SiQDs, see Fig. S8B. Without an in-depth discussion, we hypothesize that the PILR treatment of octanol-dispersed SiQDs might produce luminescent carbon dots, which are known to arise from a solvothermal treatment.25,96
The PL decays of the ethoxy:SiQDs were then similar to the purified octoxy:SiQDs in IPA, being a combination of a resolution-limited single exponential corresponding to “gray” SiQDs and a long-lived stretched-exponential function with measured lifetimes well matching the fully radiative ones, representing bright SiQDs (see Fig. S9). The contribution of “gray” SiQDs is pronounced in S-ethoxy:SiQDs and relatively marginal in M- and L-ethoxy:SiQDs, see Fig. S10. Because of the marginal contribution of the “gray” QDs, we believe that the calculation of the ratio of dark SiQDs using eqn (4) is still a very reasonable estimate for both the M- and L-ethoxy:SiQDs, see Table 2, while for S-etoxy:SiQDs, it can serve only as an upper limit.
Overall, our results confirm that the main radiative pathway in carbon-linked hydrosilylated and alkoxylated SiQDs is mostly the same, including the same radiative lifetimes of the recombination process. The same conclusion of mostly similar excited state dynamics in these two systems has recently been published elsewhere including extensive transient-absorption data.52 Consequently, the main difference seems to lie in dark QDs, which makes them an important problem to focus on.
Dark SiQDs have so far been systematically studied only in oxide-passivated matrix-embedded samples,93,97 where the application of the Purcell effect to directly determine the internal quantum yield is possible.60,93 Limpens et al.97 deduced the fraction of dark QDs D using an approach similar to ours, in particular from a comparison of literature-based radiative rates with measured lifetimes. Their relatively crude analysis of PL decays disregarding the clearly present faster initial term very likely contributes to a larger margin of error, but their deduced D values are close to ours, ranging between 5 and 2.2 before and after a passivation treatment for samples nominally closest to our M-SiQDs. Valenta et al.93 directly measured the internal quantum yield using the Purcell effect and their reported emission-wavelength-resolved D's range between 0.25 and 20 with the lowest values at an emission wavelength of around 860 nm and a systematic rise towards shorter emission wavelengths. Thus, the dark-to-bright QD ratio D in their samples is smaller than in the ones studied here, but at a cost of producing their SiQDs by fabricating a complex multilayer structure by a two-step annealing process.
Our optical studies allow us to directly compare the ratio of dark-to-bright QDs and the number of QDs in agglomerates and, in this way, to assess the influence of agglomeration on QY, see Fig. 6. The trend of PL quenching with increasing agglomeration independent of size or type of surface passivation is clearly observable. Monodispersed SiQDs showed the lowest number of dark QDs, reaching the maximal QY for our samples. Agglomeration-induced PL quenching is further supported by the difference between IAS and AES hydrosilylation approaches, where in the AES-modified SiQDs the agglomeration was higher, and their PL performance was worse. The same phenomenon was also encountered in octoxy:SiQDs. After redispersion in IPA, the agglomeration was higher and the PLQY was significantly lower. As for the smallest S-SiQDs, they also showed a similar trend of PL quenching with higher agglomeration, with a somewhat weaker dependency of the dark QD ratio on the agglomeration, but with consistently the worst PL performance (the best QY for the monoQDs around 5%). The trend of lower QY at the smallest SiQD sizes agrees with previous observations.36,57
However, even without agglomeration, we are currently unable to reach QYs higher than 20% using both hydrosilylation and PILR, implying that an additional effect is the limiting factor here. Therefore, to reach higher PL QYs and lower the number of dark SiQDs, two approaches are possible: (i) tuning the as-synthesized surface with respect to our previous work31 and (ii) selecting the right ligand and termination method for the given surface and size of the QDs.
:
1–30
:
1 with respect to the bright QDs, cause the measured lower-than-unity external QYs. By comparing the fundamental sample properties of the number of dark QDs with the number of QDs in an agglomerate, we observe a clear correlation between agglomeration and PL quenching via dark QDs. Thus, our study provides essential guidelines regarding the synthesis, surface modification, and optical and dispersive properties of SiQDs. Our results are of particular importance for developing up-scalable and non-demanding synthesis and surface modification processes for future optical and optoelectronic applications, as well as for understanding the fundamental properties of SiQDs and their colloidal dispersions.
Other measured data and software used for the evaluation of the QY and decays can be obtained from the corresponding author on reasonable request.
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