Issue 36, 2013

Radical diffusion limits to photoinhibited superresolution lithography

Abstract

Photoinhibited superresolution (PInSR) lithography is a two-color, one-photon scheme that promises high throughput far-field patterning at deep subwavelength scales. The technique requires that active species are confined for some minimum time to the illuminated area where they are generated. We investigate here the extent to which this condition is met for published materials. Using spatial and temporal control of focused beams as well as fluorescence recovery after photobleaching (FRAP), we probe the dynamics of photoinhibition in the PInSR material system. Our results indicate fast out-diffusion of unreacted photoinhibitor from the submicron optical spot during the polymerization interval, resulting in uniform rather than structured inhibition. Published results are consistent with this mechanism, indicating that superresolved polymer confinement with PInSR has not yet been shown with structured inhibition. To address the issue, we propose modifications to the material and exposure to slow inhibitor out-diffusion and accelerate polymer gelation.

Graphical abstract: Radical diffusion limits to photoinhibited superresolution lithography

Article information

Article type
Paper
Submitted
09 Сәу. 2013
Accepted
31 Мам. 2013
First published
31 Мам. 2013

Phys. Chem. Chem. Phys., 2013,15, 14862-14867

Radical diffusion limits to photoinhibited superresolution lithography

D. L. Forman, M. C. Cole and R. R. McLeod, Phys. Chem. Chem. Phys., 2013, 15, 14862 DOI: 10.1039/C3CP51512E

To request permission to reproduce material from this article, please go to the Copyright Clearance Center request page.

If you are an author contributing to an RSC publication, you do not need to request permission provided correct acknowledgement is given.

If you are the author of this article, you do not need to request permission to reproduce figures and diagrams provided correct acknowledgement is given. If you want to reproduce the whole article in a third-party publication (excluding your thesis/dissertation for which permission is not required) please go to the Copyright Clearance Center request page.

Read more about how to correctly acknowledge RSC content.

Social activity

Spotlight

Advertisements