Ink-jet patterning of graphene by cap assisted barrier-guided CVD

Ding-Rui Chen, Sheng-Kuei Chiu, Meng-Ping Wu, Chia-Chen Hsu, Chu-Chi Ting, Mario Hofmann and Ya-Ping Hsieh

RSC Adv., 2019, 9, 29105
DOI: 10.1039/C9RA03117K

Quasistatic Equilibrium Chemical Vapor Deposition of Graphene

Sami Ullah, Huy Q. Ta, Xiaoqin Yang, Yu Liu, Maria Hasan, Alicja Bachmatiuk, Lijun Liu and Mark H. Rümmeli

Adv Materials Inter, 2022, 9
DOI: 10.1002/admi.202101500

Mediator-assisted synthesis of WS2 with ultrahigh-optoelectronic performance at multi-wafer scale

Yu-Siang Chen, Sheng-Kuei Chiu, De-Liang Tsai, Chong-Yo Liu, Hsiang-An Ting, Yu-Chi Yao, Hyungbin Son, Golam Haider, Martin Kalbáč, Chu-Chi Ting, Yang-Fang Chen, Mario Hofmann and Ya-Ping Hsieh

npj 2D Mater Appl, 2022, 6
DOI: 10.1038/s41699-022-00329-1

Reaction-limited graphene CVD surpasses silicon production rate

Hao-Ting Chin, Hai-Thai Nguyen, Szu-Hua Chen, Yi-Fang Chen, Wei-Hung Chen, Zhi-Yang Chou, Yi-Hung Chu, Zhi-Long Yen, Chu-Chi Ting, Mario Hofmann and Ya-Ping Hsieh

2D Mater., 2021, 8, 035016
DOI: 10.1088/2053-1583/abf235

Solid-diffusion-facilitated cleaning of copper foil improves the quality of CVD graphene

Dinh-Tuan Nguyen, Wan-Yu Chiang, Yen-Hsun Su, Mario Hofmann and Ya-Ping Hsieh

Sci Rep, 2019, 9
DOI: 10.1038/s41598-018-36390-4