Issue 14, 2018

Oxidation of rubrene, and implications for device stability

Abstract

The rapid spontaneous photo-oxidation of rubrene to form endo-peroxide, rubrene-Ox1, was monitored via1H NMR and UV-vis spectroscopy. The reaction is thermally reversible, which restores high mobility devices in both the crystalline thin film and single crystal. Prolonged stirring in chlorinated solvents yields a secondary, irreversible product, rubrene-Ox2, which has lost phenol, as confirmed by single crystal analysis. An acid-catalyzed rearrangement of the endo-peroxide to form rubrene-Ox2 was identified here with Density Functional Theory (DFT). Implications of the nature of these processes for the preparation of organic transistors are described.

Graphical abstract: Oxidation of rubrene, and implications for device stability

Supplementary files

Article information

Article type
Paper
Submitted
15 12 2017
Accepted
12 1 2018
First published
15 1 2018

J. Mater. Chem. C, 2018,6, 3757-3761

Oxidation of rubrene, and implications for device stability

J. T. Ly, S. A. Lopez, J. B. Lin, J. J. Kim, H. Lee, E. K. Burnett, L. Zhang, A. Aspuru-Guzik, K. N. Houk and A. L. Briseno, J. Mater. Chem. C, 2018, 6, 3757 DOI: 10.1039/C7TC05775J

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