Issue 4, 2016

Solution based CVD of main group materials

Abstract

This critical review focuses on the solution based chemical vapour deposition (CVD) of main group materials with particular emphasis on their current and potential applications. Deposition of thin films of main group materials, such as metal oxides, sulfides and arsenides, have been researched owing to the array of applications which utilise them including solar cells, transparent conducting oxides (TCOs) and window coatings. Solution based CVD processes, such as aerosol-assisted (AA)CVD have been developed due to their scalability and to overcome the requirement of suitably volatile precursors as the technique relies on the solubility rather than volatility of precursors which vastly extends the range of potentially applicable compounds. An introduction into the applications and precursor requirements of main group materials will be presented first followed by a detailed discussion of their deposition reviewed according to this application. The challenges and prospects for further enabling research in terms of emerging main group materials will be discussed.

Graphical abstract: Solution based CVD of main group materials

Article information

Article type
Review Article
Submitted
18 8 2015
First published
08 10 2015
This article is Open Access
Creative Commons BY license

Chem. Soc. Rev., 2016,45, 1036-1064

Author version available

Solution based CVD of main group materials

C. E. Knapp and C. J. Carmalt, Chem. Soc. Rev., 2016, 45, 1036 DOI: 10.1039/C5CS00651A

This article is licensed under a Creative Commons Attribution 3.0 Unported Licence. You can use material from this article in other publications without requesting further permissions from the RSC, provided that the correct acknowledgement is given.

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