Issue 5, 2021

Infrared spectroscopy depth profiling of organic thin films

Abstract

Organic thin films are widely used in organic electronics and coatings. Such films often feature film-depth dependent variations of composition and optoelectronic properties. State-of-the-art depth profiling methods such as mass spectroscopy and photoelectron spectroscopy rely on non-intrinsic species (vaporized ions, etching-induced surface defects), which are chemically and functionally different from the original materials. Here we introduce an easily-accessible and generally applicable depth profiling method: film-depth-dependent infrared (FDD-IR) spectroscopy profilometry based on directly measuring the intrinsic material after incremental surface-selective etching by a soft plasma, to study the material variations along the surface-normal direction. This depth profiling uses characteristic vibrational signatures of the involved compounds, and can be used for both conjugated and non-conjugated, neutral and ionic materials. A film-depth resolution of one nanometer is achieved. We demonstrate the application of this method for investigation of device-relevant thin films, including organic field-effect transistors and organic photovoltaic cells, as well as ionized dopant distributions in doped semiconductors.

Graphical abstract: Infrared spectroscopy depth profiling of organic thin films

Supplementary files

Article information

Article type
Communication
Submitted
25 12 2020
Accepted
10 2 2021
First published
11 2 2021

Mater. Horiz., 2021,8, 1461-1471

Infrared spectroscopy depth profiling of organic thin films

J. Yu, Y. Xing, Z. Shen, Y. Zhu, D. Neher, N. Koch and G. Lu, Mater. Horiz., 2021, 8, 1461 DOI: 10.1039/D0MH02047H

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