Insight into the mechanism of different substituents on the zinc-oxo cluster in solubility switching

Fang-Ling Yang, Zong-Biao Ye, Dong-Xu Yang, Yu-Qi Chen, Pan-Pan Zhou and Fu-Jun Gou

Nanoscale, 2025, 17, 14716
DOI: 10.1039/D5NR00620A

Patterning of metal acetylacetonate complex via extreme-ultraviolet light-induced chemical reaction and straightforward thermal development process

Jinhwan Byeon, Dowon Kim, Sangjin Kim, Jaeboong Ahn, Dong Suk Oh, Yang Hun Yoon, Hae-geun Jee, Yejoon Kim, Chan-Cuk Hwang and Sukwon Hong

Materials Today Chemistry, 2025, 43, 102474
DOI: 10.1016/j.mtchem.2024.102474

Synthesis and Characterizations of a Nonalkyl Tin Oxo Cluster and its Application as High EUV Absorption Coefficient and Etch Resistant Inorganic Resist for EUV Lithography

Hyeok Yun, Soyeong Heo, Jiyoung Bang, Minyeob Kim, Hyung-Bae Moon, Siwoo Noh, Geonhwa Kim, Hee-Seon Lee, Kyuyoung Heo, Sangsul Lee, Ki-Jeong Kim, Cheol-Min Kim and Hyun-Dam Jeong

Inorg. Chem., 2025, 64, 5302
DOI: 10.1021/acs.inorgchem.5c00495

Enhancing performance of Ti-Zn-oxo clusters for advanced lithography: effect of vertical ionization potential on sensitivity

Daohan Wang, Xiaofeng Gong, Runfeng Xu, Min Zhang, Danhong Zhou, Jiangli Fan, Jianjun Du, Jun Zhao, Jianhua Zhang, Pengzhong Chen and Xiaojun Peng

Sci. China Chem., 2025
DOI: 10.1007/s11426-025-2632-y

Metal-Core-Specific Screening with Machine Learning: Accelerating the Discovery of Metal Oxide Clusters for Enhanced EUV Lithography Resolution

Fang-Ling Yang, Zong-Biao Ye, Yu-Qi Chen, Pan-Pan Zhou and Fu-Jun Gou

J. Phys. Chem. Lett., 2025, 16, 274
DOI: 10.1021/acs.jpclett.4c03250

Computational Study of Organotin Oxide Systems for Extreme Ultraviolet Photoresist

Jingbin Li, Zhefeng Wang and Han Wang

J. Phys. Chem. A, 2025, 129, 1420
DOI: 10.1021/acs.jpca.4c07585