Issue 1, 2025

Electrophoretically deposited artificial cathode electrolyte interphase for improved performance of NMC622 at high voltage operation

Abstract

High-voltage Ni-rich active materials are widely used in cathodes of high-energy-density lithium-ion batteries (LIBs). However, the high charge cutoff voltages lead to significant degradation and capacity fading, caused by electrolyte decomposition, transition metal dissolution, structural distortion, and more. Herein, we present an artificial cathode electrolyte interphase (ART-CEI) as a protective coating on the surface of the LiNi0.6Mn0.2Co0.2O2 (NMC622) cathode. A composite film, prepared from argyrodite Li6PS5Cl (LPSC) ion conducting nanoparticles and a polymerized ionic liquid (PIL) as a binder, was electrophoretically deposited on the surface of the cathode. We found that capacity retention at high-voltage operation (4.3 and 4.5 V) is improved due to the coating. Besides the stability improvement, the electrochemical performance of the coated cathode shows an enhancement in rate performance and lower resistances of the anode solid electrolyte interphase (SEI), the cathode electrolyte interphase (CEI), and charge transfer processes during cycling.

Graphical abstract: Electrophoretically deposited artificial cathode electrolyte interphase for improved performance of NMC622 at high voltage operation

Supplementary files

Article information

Article type
Paper
Submitted
16 set 2024
Accepted
21 nov 2024
First published
21 nov 2024
This article is Open Access
Creative Commons BY license

RSC Appl. Interfaces, 2025,2, 261-278

Electrophoretically deposited artificial cathode electrolyte interphase for improved performance of NMC622 at high voltage operation

I. Anconina and D. Golodnitsky, RSC Appl. Interfaces, 2025, 2, 261 DOI: 10.1039/D4LF00319E

This article is licensed under a Creative Commons Attribution 3.0 Unported Licence. You can use material from this article in other publications without requesting further permissions from the RSC, provided that the correct acknowledgement is given.

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