Volume 216, 2019
From the journal:

Faraday Discussions

Photo-protection/photo-damage in natural systems: general discussion

Michael Ashfold, ORCID logo   Shuming Bai, ORCID logo   Stephen Bradforth,   Pavel Chabera, ORCID logo   Jeffrey Cina,   Carlos E. Crespo-Hernández, ORCID logo   Natércia das Neves Rodrigues,   Marta Duchi,   Graham Fleming,   Christopher Grieco,   Scott Habershon,   Michael Haggmark,   Sharon Hammes-Schiffer,   Shou-Ting Hsieh,   Bern Kohler, ORCID logo   Heiko Lokstein, ORCID logo   Andrew Marcus,   Todd Martinez, ORCID logo   Spiridoula Matsika,   Thomas A. A. Oliver, ORCID logo   Luis Ortiz-Rodríguez,   Tomas Polivka,   Minjung Son, ORCID logo   Vasilios Stavros,   Collin Steen, ORCID logo   Matthew Turner,   Peter Jomo Walla  and  Jack Woolley  

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Photo-protection/photo-damage in natural systems: general discussion

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Article information

DOI
https://doi.org/10.1039/C9FD90031D
Article type
Discussion
First published
05 júl. 2019

Faraday Discuss., 2019,216, 538-563

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Photo-protection/photo-damage in natural systems: general discussion

M. Ashfold, S. Bai, S. Bradforth, P. Chabera, J. Cina, C. E. Crespo-Hernández, N. das Neves Rodrigues, M. Duchi, G. Fleming, C. Grieco, S. Habershon, M. Haggmark, S. Hammes-Schiffer, S. Hsieh, B. Kohler, H. Lokstein, A. Marcus, T. Martinez, S. Matsika, T. A. A. Oliver, L. Ortiz-Rodríguez, T. Polivka, M. Son, V. Stavros, C. Steen, M. Turner, P. J. Walla and J. Woolley, Faraday Discuss., 2019, 216, 538 DOI: 10.1039/C9FD90031D

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