Hyeon Jin Yu‡
ab,
Mahn Jeong‡a,
Young Soo Lim*a,
Won-Seon Seoa,
O-Jong Kwonc,
Cheol-Hee Park*c and
Hae-Jin Hwangb
aEnergy and Environmental Division, Korea Institute of Ceramic Engineering and Technology, Seoul 153-801, Republic of Korea. E-mail: yslim@kicet.re.kr
bLG Chem/Research Park, Daejeon 305-380, Republic of Korea. E-mail: pmoka@lgchem.com
cDivision of Materials Science and Engineering, Inha University, Incheon 402-751, Republic of Korea
First published on 2nd September 2014
We report the effects of Cu addition on the charge transport properties in n-type CuxBi2Te3 composites. The conducting behavior of the composites changed from metallic to semiconducting character with the increase in the amount of Cu, and its origin was found to be the decrease in the electron concentration by the substitution of Bi with Cu. Hall mobilities in the Cu-substituted composites were significantly enhanced due to the alleviated ionized impurity scattering, however, they were governed dominantly by electron–acoustic phonon scattering at relatively high temperature. As well as the carrier concentration and mobility, the electronic structure of Bi2Te3 was also affected by the Cu addition, and it was manifested by both the increase in the band gap (∼198 meV in Cu0.04Bi2Te3) and the reduction in the density of state effective mass in the Cu-substituted Bi2Te3 composites.
m) consisting of three 2D quintuple layers (Te1–Bi–Te2–Bi–Te1).2,3 The 2D layers are weakly bound to each other by van der Waals force, and the gap between the 2D layers is known to be easy diffusion path for external atoms. Actually, rapid diffusion of Cu atoms through the van der Waals gap has been evidenced by early studies, and electrons can be donated by the intercalated Cu atoms.4,5 Liu et al. reported that the Cu intercalation not only increases the electron concentration, but also reduces the thermal conductivity.6 Furthermore, reproducibility of n-type Bi2Te3 composite can also be improved by the reduction of Te-vacancies and also the uncontrollable defect states related to dangling bonds at the grain boundaries.6 Similar effects has also been reported by Han et al., and the highest thermoelectric figure of merit (ZT = S2σT/κ, where T is absolute temperature) of 1.15 has been achieved in Cu0.07Bi2Te3 at room temperature in their experiments.7
Although Cu has been reported as a donor in most studies, there have also been few reports on the p-type doping effects of Cu in Bi2Te3.8,9 In this case, Cu atoms locate at Bi-sites rather than the van der Waals gap. Although detailed charge transport properties were not proposed, Cui et al. observed the increase of Seebeck coefficient in Cu-doped Bi2Te3, which implying the decrease of the electron by Cu-doping.8 Based on the density functional theory calculations, Chen et al. recently reported that the substitution of Cu for Bi is slight easier than the intercalation of Cu into the van der Waals gap.9 According to their results, Cu acts as both a donor and an acceptor depending on the amount of Cu in Bi2Te3. Although Cu is known to be a promising dopant to achieve high ZT in n-type Bi2Te3, the effects of Cu on the charge transport in Bi2Te3 composite has not yet been fully understood as described above.
Herein, we report the charge transport properties in CuxBi2Te3 composites (x = 0, 0.01, 0.02, and 0.04), which prepared by spark plasma sintering. The substitution of Cu for the Bi site was evidenced by Rietveld refinement of X-ray diffraction (XRD) pattern, and it led to the decrease in the electron concentration. As well as the p-type doping effect, the increase in the band gap and the reduction in the density of state (DOS) effective mass were observed in the Cu-substituted composites. This result clearly demonstrates that the addition of Cu induces significant modification in the electronic structure of Bi2Te3. Also, enhancement of the Hall mobilities was observed in the Cu-substituted composites, and its origin was discussed in terms of the alleviated ionized impurity scattering and the reduced effective mass.
| Cu content (x) | ao (Å) | co (Å) | Bi-Te1 (Å) | Bi-Te2 (Å) | Bi2TeO5 (wt%) | Rwp (%) |
|---|---|---|---|---|---|---|
| 0 | 4.386(1) | 30.48(1) | 3.2468 | 3.0765 | 1.95 | 6.18 |
| 0.01 | 4.386(1) | 30.49(1) | 3.2471 | 3.0753 | 2.45 | 5.94 |
| 0.02 | 4.386(1) | 30.49(1) | 3.2472 | 3.0729 | 2.95 | 6.37 |
| 0.04 | 4.385(1) | 30.51(1) | 3.2475 | 3.0739 | 1.81 | 5.86 |
They were mainly composed of Bi2Te3 phase (JCPDS, no. 15-0863), and CuxTe secondary phase7 was not detected at all even in log-scale intensity. However, a small amount of Bi2TeO5 phase (denoted by *) was observed in all composites. The lattice parameters along a-direction (ao) were almost constant in the composites, while those along c-direction (co) increased with the increase in the Cu content as shown in Fig. 1(b). In Cu-intercalated Bi2Te3 composites, Han et al. observed the decrease in the lattice parameter along c-direction with increase in the Cu content up to x = 0.03.7 Therefore, this result implies that the Cu atoms are not intercalated into the van der Waals gap, but substituted for the Bi-sites in this experiment. The amounts of Cu at the Bi site were obtained by refining Bi occupancy with constraints of the atomic displacement factors for Bi = Te1 (3a) = Te2 (6c). For compositions with x = 0 and 0.01, no significant amounts of Cu were observed. However, it is noteworthy that the Cu occupancy at Bi site was refined as 0.017(7) for x = 0.02, and 0.040(8) for x = 0.04, respectively. Therefore, Cu atoms preferentially locate at the Bi sites in this experimental condition. In literature, the solubility limit of intercalated Cu in the van der Waals gap was reported to be x = 0.08.7 Although we could not observed the solubility limit of Cu in Bi site, our result shows that the solubility limit should be higher than x = 0.04. The role of the substituted Cu atoms is expected to be p-type dopant. Furthermore, this substitution of Bi with Cu can lead to the formation of the p-type antisite defect of BiTe due to the cation-excess condition.10
Fig. 1(c) represents the relative intensity of (006) to (015) peak and also the full width at half maximum (FWHM) of (015) main peaks of the XRD patterns. Both the relative intensities and the FWHMs were not strongly dependent on the amount of Cu in the composites. Furthermore, the average relative intensity was determined to be ∼0.11 and it was very close to the value (∼0.10) from the standard powder XRD pattern of Bi2Te3. It indicates that the grains in the sintered bodies are almost randomly oriented in the CuxBi2Te3 composites, and that the average grain size is not strongly dependent on the amount of Cu in the composites.
Fig. 2(a)–(d) are SEM micrographs of the fractured surfaces of the CuxBi2Te3 composites with x = 0, 0.01, 0.02, and 0.04, respectively. As expected from the XRD results, the microstructures in the composites were almost identical to each other. Therefore, it is possible to compare the following charge transport properties directly without further consideration on the additional effects of the microstructure.
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| Fig. 2 (a)–(d) SEM micrographs of the fractured surfaces of the CuxBi2Te3 composites with x = 0, 0.01, 0.02, and 0.04, respectively. | ||
Temperature-dependent Hall mobilities of the CuxBi2Te3 composites are shown in Fig. 3(c). The mobilities of the composites were enhanced by the Cu addition, and they were decreasing with increasing temperature due to the electron–acoustic phonon scattering (μ ∝ T−3/2) in all composites.13 As shown in Fig. 3(d), it has been reported that the Hall mobility in n-type Bi2Te3 decreases with the increase in the carrier concentration at room temperature. It is noteworthy that our result is in a good agreement with the reported values which obtained even from single crystals,14–16 nanostructured composites,7,16,17 and thin films.18,19 Considering Mathiessen's rule for the mobility (1/μ = 1/μph + 1/μii + 1/μgb, where μph, μii, and μgb are the mobilities governed by phonon scattering, ionized impurity scattering and grain boundary scattering, respectively), this result can only be explained by the ionized impurity scattering.20 Although the mobility is obviously influenced by the electron–phonon scattering in whole temperature range as shown in Fig. 3(c), the mobility in n-type Bi2Te3 is also affected by the ionized impurity scattering at relatively low temperature. It can be manifested by the temperature-dependence of the mobility in the inset of Fig. 3(c). The mobility slightly deviates from the relation of μ ∝ T−3/2 at relatively low temperature due to the influence of the ionized impurity scattering, and this deviation becomes much severe in the composites which containing relatively small Cu content. Therefore, the alleviated ionized impurity scattering can be an origin for the enhancement of the mobility in Cu-substituted Bi2Te3 composites.
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| Fig. 4 (a) Seebeck coefficients of CuxBi2Te3 composites and (b) A plot of S·n2/3 vs. T for the estimation of DOS effective masses based on Pisarenko relation. | ||
From the Seebeck coefficient and the carrier concentration, the DOS effective mass, i.e., the effective mass at Fermi level, was estimated by using Pisarenko relation. The slopes of S·n2/3 vs. T in Fig. 4(b) indicate the DOS effective masses in the composites, and they exhibited quite linear relationship with temperature except for x = 0.04.21 Because eqn (1) is valid in homopolar semiconductor, the effective mass in Cu0.04Bi2Te3 could not be exactly deduced due to its intrinsic character.22 The effective masses in Bi2Te3, Cu0.01Bi2Te3 and Cu0.02Bi2Te3 were 0.76, 0.64 and 0.47 me, respectively. Therefore, the reduction in the effective mass can be the other origin for the enhanced mobilities in the Cu-substituted Bi2Te3 composites in Fig. 3(c). With these results, it can be concluded that the Cu addition not only affects the electron concentration in the composites, but also induces significant modification in the electronic structure of Bi2Te3.
Footnotes |
| † Electronic supplementary information (ESI) available: XPS characterization of Cu0.04Bi2Te3. See DOI: 10.1039/c4ra07134d |
| ‡ H.J. Yu and M. Jeong contributed equally to this work. |
| This journal is © The Royal Society of Chemistry 2014 |