Issue 21, 2024

Toward robust lithium–sulfur batteries via advancing Li2S deposition

Abstract

Lithium–sulfur batteries (LSBs) with two typical platforms during discharge are prone to the formation of soluble lithium polysulfides (LiPS), leading to a decrease in the cycling life of the battery. Under practical working conditions, the transformation of S8 into Li2S is cross-executed rather than a stepwise reaction, where the liquid LiPS to solid Li2S conversion can occur at a high state of charge (SOC) to maintain the current requirement. Therefore, advancing Li2S deposition can effectively reduce the accumulation of LiPSs and ultimately improve the reaction kinetics. Herein, a “butterfly material” GeS2-MoS2/rGO is used as a sulfur host. Rich catalytic heterointerfaces can be obtained via the abundant S–S bonds formed between GeS2 and MoS2. MoS2 (left wing) can enhance LiPS adsorption, while the lattice-matching nature of Fdd2 GeS2 (right wing) and Fm[3 with combining macron]m Li2S can induce multiple nucleation and regulate the 3D growth of Li2S. Li2S deposition can be advanced to occur at 80% SOC, thereby effectively inhibiting the accumulation of soluble LiPSs. Attributed to the synergistic effect of catalytic and lattice-matching properties, robust coin and pouch LSBs can be achieved.

Graphical abstract: Toward robust lithium–sulfur batteries via advancing Li2S deposition

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Article information

Article type
Edge Article
Submitted
12 अप्रैल 2024
Accepted
01 मई 2024
First published
01 मई 2024
This article is Open Access

All publication charges for this article have been paid for by the Royal Society of Chemistry
Creative Commons BY license

Chem. Sci., 2024,15, 7949-7964

Toward robust lithium–sulfur batteries via advancing Li2S deposition

X. Jiao, X. Tang, J. Li, Y. Xiang, C. Li, C. Tong, M. Shao and Z. Wei, Chem. Sci., 2024, 15, 7949 DOI: 10.1039/D4SC02420F

This article is licensed under a Creative Commons Attribution 3.0 Unported Licence. You can use material from this article in other publications without requesting further permissions from the RSC, provided that the correct acknowledgement is given.

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