Issue 19, 2021

Liquid atomic layer deposition as emergent technology for the fabrication of thin films

Abstract

Atomic layer deposition (ALD) is widely recognized as a unique chemical vapor deposition technique for the fabrication of thin films with high conformality and precise thickness control down to the Ångstrom level, thereby allowing surface and interface nanoengineering. However, several challenges such as the availability of chemical precursors for ALD and the use of vacuum conditions have hampered its widespread adoption and scalability for mass production. In recent years, the liquid phase homolog of ALD, liquid atomic layer deposition (LALD), has emerged as a much simpler and versatile strategy to overcome some of the current constraints of ALD. This perspective describes the different strategies that have been explored to achieve conformality and sub-nanometer thickness control with LALD, as well as the current challenges it faces to become a part of the thin-film community toolbox, in particular its automation and compatibility with different types of substrates. In this regard, the important role of LALD as complementary technology to ALD is emphasized by comparing the different pathways to deposit the same material and the precursors used to do so.

Graphical abstract: Liquid atomic layer deposition as emergent technology for the fabrication of thin films

Article information

Article type
Perspective
Submitted
22 जनवरी 2021
Accepted
09 मार्च 2021
First published
10 मार्च 2021

Dalton Trans., 2021,50, 6373-6381

Liquid atomic layer deposition as emergent technology for the fabrication of thin films

O. Graniel, J. Puigmartí-Luis and D. Muñoz-Rojas, Dalton Trans., 2021, 50, 6373 DOI: 10.1039/D1DT00232E

To request permission to reproduce material from this article, please go to the Copyright Clearance Center request page.

If you are an author contributing to an RSC publication, you do not need to request permission provided correct acknowledgement is given.

If you are the author of this article, you do not need to request permission to reproduce figures and diagrams provided correct acknowledgement is given. If you want to reproduce the whole article in a third-party publication (excluding your thesis/dissertation for which permission is not required) please go to the Copyright Clearance Center request page.

Read more about how to correctly acknowledge RSC content.

Social activity

Spotlight

Advertisements