Issue 44, 2021

Competition between diamond nucleation and growth under bias voltage by microwave plasma chemical vapor deposition

Abstract

Diamond nucleation on iridium (001) substrates was investigated under different bias conditions. High-density epitaxial nucleation can be obtained in a narrow bias window. This paper reports both the typical nucleation and growth behaviors of Ir substrates. The bias current change laws with the bias duration time were directly recorded; further, the surface modification of Ir substrates and nucleation behaviors at the interface were characterized by scanning electron microscopy (SEM) and transmission electron microscopy (TEM). In high-density epitaxial nucleation, the bias current decreases as the duration time increases when the iridium surface is dramatically modified with the furrows and arrows preferentially aligned along the [110] direction; however, no diamond grains can be observed from the TEM, except for the carbon layer at the interface. In bias-enhanced growth, the bias current initially decreased, then increased. The grains can be detected by SEM after the biasing stage. A competition mechanism between diamond nucleation and growth under a bias voltage is proposed for this phenomenon, in which the surface nucleation and bulk nucleation coexist and compete.

Graphical abstract: Competition between diamond nucleation and growth under bias voltage by microwave plasma chemical vapor deposition

Article information

Article type
Paper
Submitted
01 juil. 2021
Accepted
09 oct. 2021
First published
11 oct. 2021

CrystEngComm, 2021,23, 7731-7738

Competition between diamond nucleation and growth under bias voltage by microwave plasma chemical vapor deposition

W. Wang, B. Dai, G. Shu, Y. Wang, S. Fang, S. Yang, X. Liu, B. Liu, R. Xue, J. Zhao, K. Liu, L. Yang, J. Han and J. Zhu, CrystEngComm, 2021, 23, 7731 DOI: 10.1039/D1CE00865J

To request permission to reproduce material from this article, please go to the Copyright Clearance Center request page.

If you are an author contributing to an RSC publication, you do not need to request permission provided correct acknowledgement is given.

If you are the author of this article, you do not need to request permission to reproduce figures and diagrams provided correct acknowledgement is given. If you want to reproduce the whole article in a third-party publication (excluding your thesis/dissertation for which permission is not required) please go to the Copyright Clearance Center request page.

Read more about how to correctly acknowledge RSC content.

Social activity

Spotlight

Advertisements