Atomic layer deposition and first principles modeling of glassy Li3BO3–Li2CO3 electrolytes for solid-state Li metal batteries

Eric Kazyak, Kuan-Hung Chen, Andrew L. Davis, Seungho Yu, Adrian J. Sanchez, Jose Lasso, Ashley R. Bielinski, Travis Thompson, Jeff Sakamoto, Donald J. Siegel and Neil P. Dasgupta

J. Mater. Chem. A, 2018, 6, 19425
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Multicolored one-dimensional photonic crystal coatings with excellent mechanical robustness, strong substrate adhesion, and liquid and particle impalement resistance

Wenbin Niu, Lele Zhang, Yunpeng Wang and Shufen Zhang

J. Mater. Chem. C, 2019, 7, 3463
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Recent trends in thermal atomic layer deposition chemistry

Georgi Popov, Miika Mattinen, Anton Vihervaara and Markku Leskelä

Journal of Vacuum Science & Technology A, 2025, 43
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Formation Mechanisms of Hexagonal Boron Nitride Nanosheets in Solvothermal Exfoliation

Songfeng E, Jiayi Liu, Ruixia Zhao, Doudou Ning and Zhaoqing Lu

Langmuir, 2023, 39, 1619
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Inhibitor-free area-selective atomic layer deposition of SiO2 through chemoselective adsorption of an aminodisilane precursor on oxide versus nitride substrates

Jeong-Min Lee, Jinseon Lee, Hongjun Oh, Jiseong Kim, Bonggeun Shong, Tae Joo Park and Woo-Hee Kim

Applied Surface Science, 2022, 589, 152939
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A Study on the Gap-Fill Process Deposited by the Deposition/Etch/Deposition Method in the Space-Divided PE-ALD System

Baek-Ju Lee, Dong-Won Seo and Jae-Wook Choi

Coatings, 2022, 13, 48
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A Process for Topographically Selective Deposition on 3D Nanostructures by Ion Implantation

Woo-Hee Kim, Fatemeh Sadat Minaye Hashemi, Adriaan J. M. Mackus, Joseph Singh, Yeongin Kim, Dara Bobb-Semple, Yin Fan, Tobin Kaufman-Osborn, Ludovic Godet and Stacey F. Bent

ACS Nano, 2016, 10, 4451
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Thermal adsorption-enhanced atomic layer etching of Si3N4

Woo-Hee Kim, Dougyong Sung, Sejin Oh, Jehun Woo, Seungkyu Lim, Hyunju Lee and Stacey F. Bent

Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, 2018, 36
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Degradation of ultra-thin boron films in air

L.B. Bayu Aji, A.A. Baker, J.H. Bae, A.M. Hiszpanski, E. Stavrou, S.K. McCall and S.O. Kucheyev

Applied Surface Science, 2018, 448, 498
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Thermal Atomic Layer Deposition of Device-Quality SiO2 Thin Films under 100 °C Using an Aminodisilane Precursor

Dae Hyun Kim, Han Jin Lee, Heonjong Jeong, Bonggeun Shong, Woo-Hee Kim and Tae Joo Park

Chem. Mater., 2019, 31, 5502
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Atomic Layer Deposition of Localized Boron- and Hydrogen-Doped Aluminum Oxide Using Trimethyl Borate as a Dopant Precursor

Felix Mattelaer, Michiel Van Daele, Matthias M. Minjauw, Mikko Nisula, Simon D. Elliott, Timo Sajavaara, Jolien Dendooven and Christophe Detavernier

Chem. Mater., 2020, 32, 4152
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High wet-etch resistance SiO2 films deposited by plasma-enhanced atomic layer deposition with 1,1,1-tris(dimethylamino)disilane

Su Min Hwang, Harrison Sejoon Kim, Dan N. Le, Akshay Sahota, Jaebeom Lee, Yong Chan Jung, Sang Woo Kim, Si Joon Kim, Rino Choi, Jinho Ahn, Byung Keun Hwang, Xiaobing Zhou and Jiyoung Kim

Journal of Vacuum Science & Technology A, 2022, 40
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Area‐Selective Atomic Layer Deposition Using Vapor Dosing of Short‐Chain Alkanethiol Inhibitors on Metal/Dielectric Surfaces

Jeongbin Lee, Jeong‐Min Lee, Ji‐Hoon Ahn, Tae Joo Park and Woo‐Hee Kim

Adv Materials Inter, 2022, 9
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Uniform color coating of multilayered TiO2/Al2O3 films by atomic layer deposition

Woo-Hee Kim, Hyungjun Kim and Han-Bo-Ram Lee

J Coat Technol Res, 2017, 14, 177
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In situ XPS study of low temperature atomic layer deposition of B2O3 films on Si using BCl3 and H2O precursors

Aparna Pilli, Jessica Jones, Veronica Lee, Natasha Chugh, Jeffry Kelber, Frank Pasquale and Adrien LaVoie

Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, 2018, 36
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Dimerization equilibrium of group 13 precursors for vapor deposition of thin films

Miso Kim and Bonggeun Shong

Computational and Theoretical Chemistry, 2024, 1242, 114953
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Diffusion of Phosphorus and Boron from Atomic Layer Deposition Oxides into Silicon

Svetlana Beljakowa, Peter Pichler, Bodo Kalkofen and René Hübner

Physica Status Solidi (a), 2019, 216
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Atomic layer deposition of BN as a novel capping barrier for B2O3

Aparna Pilli, Jessica Jones, Natasha Chugh, Jeffry Kelber, Frank Pasquale and Adrien LaVoie

Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, 2019, 37
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Boron doping-induced interconnected assembly approach for mesoporous silicon oxycarbide architecture

Guanjia Zhu, Rui Guo, Wei Luo, Hua Kun Liu, Wan Jiang, Shi Xue Dou and Jianping Yang

National Science Review, 2021, 8
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Multicolored Photonic Crystal Carbon Fiber Yarns and Fabrics with Mechanical Robustness for Thermal Management

Wenbin Niu, Lele Zhang, Yunpeng Wang, Zhiwei Wang, Kai Zhao, Suli Wu, Shufen Zhang and Alfred Iing Yoong Tok

ACS Appl. Mater. Interfaces, 2019, 11, 32261
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Enhanced photocatalytic activity for degrading pollutants of g-C3N4 by promoting oxygen adsorption after H3BO3 modification

Chengming Li, Fazal Raziq, Chong Liu, Zhijun Li, Liqun Sun and Liqiang Jing

Applied Surface Science, 2015, 358, 240
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Use of B2O3 films grown by plasma-assisted atomic layer deposition for shallow boron doping in silicon

Bodo Kalkofen, Akinwumi A. Amusan, Muhammad S. K. Bukhari, Bernd Garke, Marco Lisker, Hassan Gargouri and Edmund P. Burte

Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, 2015, 33
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Atomic-layer-deposited BOx/Al2O3 stack for crystalline silicon surface passivation

Xinyu Wang, Kun Gao, Dacheng Xu, Kun Li, Chunfang Xing, Xinliang Lou, Zhaojun Su and Xinbo Yang

Solar Energy Materials and Solar Cells, 2023, 260, 112481
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Comparison of B2O3 and BN deposited by atomic layer deposition for forming ultrashallow dopant regions by solid state diffusion

Steven Consiglio, Robert D. Clark, David O'Meara, Cory S. Wajda, Kandabara Tapily and Gert J. Leusink

Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, 2016, 34
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Mechanistic Investigation on Thermal Atomic Layer Deposition of Group 13 Oxides

Abu Saad Ansari, Shimeles Shumi Raya and Bonggeun Shong

J. Phys. Chem. C, 2020, 124, 17121
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Correlation between SiO2 growth rate and difference in electronegativity of metal–oxide underlayers for plasma enhanced atomic layer deposition using tris(dimethylamino)silane precursor

Erika Maeda, Toshihide Nabatame, Masafumi Hirose, Mari Inoue, Akihiko Ohi, Naoki Ikeda and Hajime Kiyono

Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, 2020, 38
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Influence of O(3P)/O2 Flux on the Atomic Layer Deposition of B2O3 Using Trimethyl Borate at Room Temperature

Aparna Pilli, Veronica Lee, Jessica Jones, Natasha Chugh, Jincheng Du, Frank Pasquale, Adrien LaVoie and Jeffry Kelber

J. Phys. Chem. C, 2020, 124, 25846
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